Used AMAT / APPLIED MATERIALS Centura AP Ultima X #9253668 for sale

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ID: 9253668
Wafer Size: 12"
Vintage: 2013
HDP CVD System, 12" Chamber A, B & C: Chamber type: Ultima X HDP CVD Gas configuration (sccm): MFC full scale Gas / sccm O2 / 1000 NF3 / 100 HE / 600 SiH4 / 300 H2 / 1000 AR / 1000 SiH4 / 50 HE / 400 AR / 100 NF3 / 3000 AR / 3000 RF Source: 1.8 - 2.17 MHz, 10000W (Max) RF Bias: 13.56 MHz, 9500W (Max) RF RPS: 400 kHz, 6000W (Max) 2013 vintage.
AMAT / APPLIED MATERIALS Centura AP Ultima X is a platen-type reactor designed for the fabrication, deposition, etching, and engineering of advanced integrated circuit devices. It features an Ultra Low Thermal Expansion (ULTE) quartz plate that is suspended above the process chamber and a sub-atmospheric pressure chamber with adjustable temperature control that range from -60°C to +150°C. Its thermal management capabilities provide temperature uniformity and process repeatability, which are essential for a robust production environment. The Ultima X reactor employs multiple process technologies including sputtering, plasma etching, carbon evaporation, metal-organic chemical vapor deposition (MOCVD), atomic layer deposition (ALD), and a variety of other deposition techniques. This ensures it can accommodate the fabrication of highly advanced semiconductor-based technologies such as silicon-on-insulator (TRI/SOI) and FinFET/ III-V devices. It is also equipped with an automated tool compatibility module to provide a unified platform across multiple toolsets. The Ultima X reactor is widely used due to its ability to generate high process throughputs and low defect densities. Its multiple process cells are equipped with automated interlocked plasma containment shield which prevents plasma from entering neighboring chambers, resulting in superior contamination control. The reusable cages that hold parts within the chamber provide precision motion control for accurate batch loading and unloading ensuring rapid wafer handling and servo motor technology ensures reliable processing. The Ultima X also features computer controlled safety systems and smart energy management that allow operators to maximize resource utilization while minimizing energy costs. The Ultima X is the industry leader in providing advanced layers of integration for multi-view deposition and dry etching process flows. Its patented automation and control architecture provides superior process repeatability, precision, and yields for device production. Additionally, its thermal design and ultra quiet operating system make it an ideal choice for high-volume manufacturing applications. Overall, AMAT Centura AP Ultima X is an efficient, reliable and high productivity reactor which continues to provide critical advancement for the semiconductor industry.
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