Used AMAT / APPLIED MATERIALS Centura AP Ultima X #9303196 for sale

AMAT/AMAT / APPLIED MATERIALS Centura AP Ultima X reactor is a chemical vapor deposition (CVD) reactor which enables processing with flexible recipes, running multiple processes in the same chamber. The reactor is designed for device manufacturing under a wide range of conditions, with features that allow for reliable processing of advanced processes. It is an energy-efficient reactor which can be used for applications such as shallow trench isolation (STI), inter-layer dielectric (ILD), gate dielectric, metal, high-k, etc., as well as dummy field etch. It offers excellent processing stability by using a uniform, non-uniform and mixed-gas flow. AMAT Centura AP Ultima X reactor is a single-wafer-load equipment that utilizes an automated recipe generator allowing the user to quickly adjust parameters based on different process requirements. The gas system on the unit is designed for maximum flexibility, allowing for changing, mixing, and shuttling of gases. The reactor operates with Freon-13 and otherFreon-based refrigerants, allowing for a range of temperature settings. The reactor also has a visualization module that provides real-time process information as recipes are run. The reactor has a combination of both chemical delivery and automation systems, enabling superior thermal control during atomic layer deposition (ALD) and CVD processes. The reactor has a feature that automatically adjusts for temperature before starting the process. This ensures repeatability from run to run and eliminates manual intervention, resulting in greater process control. The ambient temperature of APPLIED MATERIALS Centura AP Ultima X reactor is adjustable up to a maximum of 800°C. Furthermore, the reactor also has a temperature control machine that maintains the temperature in the process chamber for constant film growth on the wafers. APPLIED MATERIALS/Centura AP Ultima X is a comprehensive, energy-efficient, and high-performing reactorthat is ideally suited for advanced process development work. Its high degree of automation, excellent thermal control, and flexibility make it great for high-yield and cost-efficent device production.