Used AMAT / APPLIED MATERIALS Centura ASP+ #9116838 for sale

AMAT / APPLIED MATERIALS Centura ASP+ is a high-efficiency chemical vapor deposition (CVD) reactor designed for semiconductor wafer processing. The advanced reactor is capable of performing advanced deposition processes such as epitaxial growth, polysilicon deposition and formation of exotic films. AMAT Centura ASP+ reactor is specially designed to meet the demands of high-volume production by providing superior productivity, flexibility and superior process control. APPLIED MATERIALS Centura ASP+ reactor features an optimized design which enhances film integrity. The reactor has an extra-long semi-conductor chamber, which allows for enhanced thermal isolation and uniformity. The advanced design allows for quick and easy integration into existing manufacturing infrastructures. Additionally, Centura ASP+ reactor features several advanced technologies such as high-temperature pulsed inductive deposition (HTPID) and quick-buffer adjustment (QBA) for improved production control and sustainability. The reactor is equipped with a multi-axis, precision-motorized wafer transport system. This ensures accurate wafer placement and uniform processing without the need of manual wafer handling. Advanced plasma sources are also available, enabling advanced plasma−enabled processes such as high-density plasma (HDP) and low-pressure variable-radius electron cyclotron resonance (LP-VREC), further enhancing process reliability and control. The Centrea ASP+ reactor also features automated sensors and alarms that monitor the process values, and provide real-time data and remote monitoring capability. The advanced data acquisition and control capabilities enable operators to quickly spot changes in the process parameters, and provide the means to take corrective action if required. Additionally, the user-friendly software reduces training time and enhances operator productivity. In summary, AMAT / APPLIED MATERIALS Centura ASP+ reactor provides a world-class solution for semiconductor wafer processing, offering superior process control, reliability and efficiency. The combination of advanced features and technologies enables superior yields and uniformity without compromising on productivity. The reactor is designed to be easily integrated into existing systems, providing a reliable and cost-effective solution for high-volume production.