Used AMAT / APPLIED MATERIALS Centura DCVD / DXZ #9293854 for sale

AMAT Centura DXZ DCVD/Reactor, or CVD Reactor, is an advanced deposition equipment engineered to deliver precise and high-quality thin films for heterogeneous applications. The system is built with superior quality components and is designed to operate at temperatures up to 800 degrees Celsius, providing accurate thickness uniformity and precise control over processes. The CVD Reactor is engineered to maximize uptime and improve production with a high-quality product. Unique features of the unit include an automated process start-up, with robust process monitoring capabilities, and an optional quench recovery machine enabling recipe conversion. Additionally, the tool features a precisely controlled, high stability, heated environmental chamber allowing for unrestricted chamber loading, and a two-stage work shuttle for high throughput. The asset's integrated hardware features a specifically designed susceptor and heater rod, which provide efficient, uniform heating of the substrate, as well as precise control over temperature and pressure. The susceptor design further optimizes thin film deposition, controlling deposition rate and feature size. An electrode-free electrostatic chuck allows for processing of low surface tension substrates. The CVD Reactor utilizes a unique multi-zone digital control preheat model, allowing for up to nine separate preheat zones and is designed to provide consistent temperature control across the thermal range. By utilizing the multi-zone preheat, production throughput can be greatly increased as different process choices can be made without sacrificing temperature control. Advanced safety and monitoring features, such as an airlock equipment to control pressure and reactive gases, allow for safe and efficient operation. The system is designed to meet the highest standards of safety and performance and has been certified for use with corrosive and explosive gases. Additionally, the CVD Reactor is equipped with real-time, gas-specific monitors that measure gas distribution, continuous monitoring of process gases, and pressure measurement which allows for rapid a detection of process faults. APPLIED MATERIALS Centura DXZ DCVD/Reactor is an advanced deposition unit that provides superior preciseness and excellent film quality for a range of heterogeneous applications. Its advanced safety and monitoring features make it ideal for use with hazardous materials, while its integrated hardware and multi-zone preheat machine ensure precise temperature control and optimized throughput.