Used AMAT / APPLIED MATERIALS Centura DPN #9156591 for sale

AMAT / APPLIED MATERIALS Centura DPN is an advanced, all-in-one deposition reactor designed and used for semiconductor device fabrication processes. This deposition reactor is state-of-the-art and offers a wide range of advanced features including multi-zone temperature control, wet etch capabilities, high deposition rates, and low particulate generation. AMAT Centura DPN equipment includes a vertical magnetron-style cathode coupled with a multi-zone substrate heater for precise temperature control, all integrated into a single, full-featured processing chamber. This system offers superior film uniformity and outstanding process repeatability, as well as a range of optional features, including remote gas injection, automated load and unload capability, in-situ metrology, and in-situ throttling. The multi-zone temperature control and active drag control of APPLIED MATERIALS CENTURA (DPN) allows for uniform temperatures and substrate uniformity. APPLIED MATERIALS Centura DPN is able to maintain uniform temperatures over a wide range of geometries, with an accuracy of ±2.0°C, and a surface temperature uniformity of ±1.0°C. This provides excellent process control, enabling higher deposition rates and uniform films. Centura DPN has exceptional throughput capability with its high-speed, 10-step sequential deposition capability. This unit does not sacrifice performance while achieving high throughput rates due to advanced process control algorithms, controlling for deposition uniformity, temperature uniformity, and process repeatability. CENTURA (DPN) has been designed and optimized for advanced semiconductor device fabrications, and provides an ideal solution for a variety of applications across multiple industries. This deposition reactor provides excellent process repeatability and uniformity, as well as high throughput rates, making it an ideal substrate processing machine for the most demanding semiconductor device fabrication applications.