Used AMAT / APPLIED MATERIALS Centura (DPN+) #9174570 for sale

AMAT Centura (DPN+) is a reactor designed to provide high-performance reactive ion etching and thin-film deposition in both single-wafer and batch processing. The reactor is designed to enable process capabilities that can address challenges in the fabrication and deposition of sensitive and highly-specification materials, such as III-V device fabrication. The reactor has an advanced controller that allows users to access new advanced capabilities such as broad-area uniformity, high plasma density and high energies for etching. The lateral uniformity of the equipment is further improved by the use of a standard multi-channel source. APPLIED MATERIALS Centura (DPN+) reactor is constructed with a modular design which enables the user to customize the system to meet their specific process needs. The control unit on the reactor is designed to track the performance of the machine in order to maintain optimal overall tool performance. The reactor also utilizes advanced diagnostics which enables process engineers to monitor the process parameters in order to ensure the etch rates and other process requirements are met. AMAT / APPLIED MATERIALS Centura (DPN+) is able to achieve very precise control over electro Static Chuck pressure (ESP) and temperature dose. The unit also provides multiple pulse options that allow for adjustment of the process parameters to optimize the etch rate. The pulse technology is capable of multiple pulse options such as single pulse and multi-pulse which can enable higher etch rates and improved process control when running reactive ion etch. Further, AMAT Centura (DPN+) is equipped with advanced controllers that allow for temperature and pressure control over the etch chamber, as well as the ability to monitor and adjust the process parameters. This allows the user to set the process parameters and ensure the etch rates and other process requirements are met. The patented dual magnetrons also enable higher ion utilization efficiency and less contamination when compared to conventional RF etch tools. In addition, APPLIED MATERIALS Centura (DPN+) also provides the flexibility to expand the reactor asset by adding additional components to increase the capacity which allows the user to create a highly configurable model. With a range of multipurpose fittings and additional tooling the user can integrate the reactor into their existing production line. Overall, AMAT / APPLIED MATERIALS Centura (DPN+) reactor provides a cost-effective and robust solution that guarantees correct process performance whilst meeting the stringent requirements needed in the development and fabrication of new materials and devices. The unit, with its advanced controls, high-performance features and wide range of capabilities, facilitates precise control and accuracy of the etch process and ensures process stability, reproducibility and repeatability.