Used AMAT / APPLIED MATERIALS Centura DPS G2 #9188278 for sale

AMAT / APPLIED MATERIALS Centura DPS G2 is a thermal reactor designed for semiconductor processing. It is powered by a high-performance multi-zone process module which is capable of reaching temperatures of up to 1200°C for substrate processing. The system is constructed using a double-walled stainless steel vacuum chamber with an integrated vacuum booster that can provide up to 200 Ton of vacuum capacity. AMAT Centura DPS G2 includes exclusive in-situ gas purging technology, as well as automated systems for wafer loading and unloading. The reactor chamber is composed of an alumina ceramic inner chamber and three separate outer sections with an interlocked top cover that accompanies each section. A quartz window in the top cover facilitates viewing of the reaction chamber's interior while the remaining outer shell contains cooling channels through which inert gas can be circulated for optimum temperature control. The Centura features an innovative "Oasis effect", which uses patented in-situ gas purging technology to clean and monitor the gas levels inside the chamber. This process provides enhanced environmental control necessary for optimal chamber contamination control and wafer quality. APPLIED MATERIALS Centura DPS G2 offers several distinct advantages over conventional thermal reactors. Not only is the vacuum capacity up to 7 times greater than that of an equivalent traditional instrument, but it also features an integrated ultra-high purity gas delivery system, high-speed profile scanning, and multi-zone substrate temperature regulation. Additionally, the system is designed with advanced power control, enabling users to precisely ensure optimal process conditions and repeatable processing for every substrate. The utility of Centura DPS G2 for semiconductor processing is further enhanced by its flexibility for accommodating an array of single- and multi-step process solutions. This includes specialized applications such as low-temperature fabrications, high-temperature annealing, oxidation, nitridation, and selective epitaxial growth. The multi-zone temperature regulation ensures that each substrate can receive personalize thermal treatment, giving it the capability of performing a diversity of different processing scenarios. Overall, AMAT / APPLIED MATERIALS Centura DPS G2 is an ideal thermal reactor for a wide range of semiconductor process applications. Its extensive controllability, robust construction, and high operational capacity makes it a reliable and powerful tool for producing consistent and reliable process results.