Used AMAT / APPLIED MATERIALS Centura DPS G5 MESA #9188283 for sale

AMAT / APPLIED MATERIALS Centura DPS G5 MESA is a semiconductor reactor used in the fabrication of integrated circuits. It is a single-wafer, multi-gas, parallel-plasma Etch/Deposition system primarily used in the development of the latest high-performance devices. This reactor has a high degree of automation, improved stability, and enhanced safety features. This reactor features one hot wafer handling system and multiple process gases that can be used to etch or deposit metal layers or oxides on the wafer's surface. The ability to use multiple gases allows a wide range of processing possibilities, such as controlling metal silicide growth, allowing substrate oxidation, causing greater annealing of metal regions, etc. The single-wafer handling system allows for a high degree of control over the position of the chamber, such as tilt, angle and focus, which is critical for uniform thickness and uniformity of the layers. This reactor's advanced processing capabilities enables the highest levels of yield from the wafer fabrication process. AMAT Centura DPS G5 MESA is designed with a temperature-controlled process chamber, which provides uniform temperature distribution with a high degree of stability. This ensures that the chamber is held at the desired temperature for the entire process cycle. In addition, the chamber incorporates an automatically controlled air gap, a pair of emitter electrodes, and a variable frequency RF power supply. This reactor also features a built-in direct-reading microprocessor-based multi-parameter controller with the capability to store up to 2000 recipes, among other features. These features, combined with the reactor's low operating costs, outstanding thermal uniformity and low thermal drift, mission reliability and easy maintenance make APPLIED MATERIALS Centura DPS G5 MESA the premier choice for a wide range of fabrication processes.