Used AMAT / APPLIED MATERIALS Centura DPS G5 MESA #9379818 for sale

AMAT/AMAT / APPLIED MATERIALS Centura DPS G5 Reactor is an Etch Chamber used in the semiconductor fabrication processes. This equipment is designed to support a wide variety of applications in etching and deposition, providing high throughput and uniformity to a myriad of substrates. Its unique design offers maximum flexibility and scalability, allowing it to effectively handle one-of-a-kind or prototype designs while maintaining compatibility with industry-standard processes. AMAT Centura DPS G5 Reactor is composed of two distinct components: the chamber and the chamber controller. The chamber is composed of a quartz cylinder that is horizontally mounted within an aluminum body, which supports the temperature uniformity and the active components. Inside the chamber is the cylindrical electrode, which houses the substrate. The chamber controller provides real-time and closed-loop control of/and feedback to chamber components, allowing precise control of substrate temperature, pressure, flow, and RF power. In order to meet these precise control requirements, the G5 Reactor is equipped with a turbine driven gas-staging system and digital temperature and pressure controllers. The gas delivery unit utilizes a differential pressure-driven staging technique to ensure an optimal atomic/molecular flux and a uniform environment within the chamber. This results in faster processing speeds while maintaining excellent uniformity. Additionally, the pressure controller monitors and adjusts the pressure within the chamber to minimize the risk of contamination from external sources. Finally, the G5 Reactor is capable of supporting a variety of RF power options, ranging from 200kHz-1.7GHz, allowing for a wide range of dynamic etching capability. The G5 Reactor offers comprehensive uniformity control for both the uniformity of the substrate and the process gas. With its high uniformities and precision control of temperature, pressure, flow, and RF power, the G5 Reactor is an ideal machine for many semiconductor fabrication and deposition processes, such as sputter deposition, plasma etching and chemical vapor deposition. Its robust design and capability to handle variations in environmental conditions make it an ideal choice for engineering and research environments. Thanks to its optimized capabilities, APPLIED MATERIALS Centura DPS G5 Reactor is perfect for a wide variety of high-volume, high-precision processes and is an excellent weapon in the arsenal of the modern semiconductor fabrication laboratory.