Used AMAT / APPLIED MATERIALS Centura DPS G5 MESA #9383829 for sale

AMAT / APPLIED MATERIALS Centura DPS G5 MESA is a reactor designed for depositing metal oxide semiconductors to silicon wafers in the process of semiconductor chip fabrication. The reactor has a chamber built in a modified supercritical ion assisted deposition (SIAD) technology. This process is used for depositing a conformal coating of uniform thickness on wafers or substrates without creating excessive particle contamination. The chamber is equipped with a quartz assembly of sources, power supplies, and shapeable crucibles to provide high-precision thermal control. The process for AMAT Centura DPS G5 MESAMakes use of a time-dependent plasma source to enable precise deposition of high-quality films. This process uses an oxygen plasma, typically generated at 400 watts, to deposit a thin silicon dioxide film onto the surface of the wafer. This deposition is then followed by a high-density sputter so that additional metals can be added. The sputtering speeds the transport of the oxide and metal particles away from the substrate. The process is capable of controlling the type, thickness, and composition of the conductive semiconductor layers. On the outside of AMAT Centura DPS G5 MESA is a side panel that allows the user to monitor the generated plasma to ensure accuracy within setup parameters and optimal growth rate. The device also has a high-reliability, submerged gas supply that injects pressure-controlled oxygen gas into the chamber to better control film uniformity. A variety of sensors, including a temperature sensor, an oxygen sensor, and a pressure sensor, enables more accurate and repeatable control of the process. The innovative design of APPLIED MATERIALS Centura DPS G5 MESA makes it an ideal choice for precise and consistent depositions across multiple process stations simultaneously. The system benefits from precise radio frequency tuning, allowing the user to adjust for better film uniformity and film deposition rates. It also provides internal filtration to protect against process contaminants entering the chamber. The user can control and monitor every aspect of the process to ensure the best results. Centura DPS G5 MESA is a highly efficient and reliable reactor for depositing metal oxide semiconductors onto silicon wafers. The reactor features a patented SIAD chamber design, a side panel for monitoring plasma generation, a reliable gas supply, various sensors, and precise radio frequency tuning, allowing the user to produce precise films and predictable results.