Used AMAT / APPLIED MATERIALS Centura DPS G5 MESA #9383830 for sale

AMAT / APPLIED MATERIALS Centura DPS G5 MESA reactor is a state-of-the-art semiconductor processing equipment designed for use in advanced deposition applications. It is a modular reactor with a range of technologies that allow it to be tailored to the specific needs of a wide range of process flows. The system is based on AMAT patented MESA plasma source technology, which combines high power, high reliability, and low cost. AMAT Centura DPS G5 MESA reactor uses a multi-source architecture to deliver a truly discrete plasma source unit. It is a dual zone machine with two separate chambers, one for the plasma generation chamber and second for the substrate chamber. The plasma chamber houses two independent main source plasmas designed to ensure that ion energy, plasma density, and other plasma parameters are optimized for the specific application. It also features interchangeable gas lines, enabling the introduction of both reactive and non-reactive gases as required. The chamber is constructed from stainless steel to be gas tight, with a pressure regulated bellow and vent port to allow for easy maintenance and addition of gases. The substrate chamber houses either one or two independent process modules, depending on the tool configuration, which are supplied with power from the plasma chamber. Its modular design allows for easy replacement or reconfiguration of the modules for a variety of deposition processes. Additionally, the chamber features a double sided shutter that can be used to maintain a contamination-free environment or to optimize the temporal resolution of the substrate temperature. The substrate chamber also features an in-situ quartz crystal monitor asset for monitoring gas flows and other process parameters. APPLIED MATERIALS Centura DPS G5 MESA reactor is a reliable and cost-effective model for advanced deposition applications. Its modular design and cutting-edge technology enable unprecedented levels of process flexibility, enabling a wide variety of physically and chemically differing processes to be carried out on a single platform. Furthermore, its low operating cost and rapid cycle time make it ideal for addressing the ever-increasing need for small form factor devices.