Used AMAT / APPLIED MATERIALS Centura DPS G5 MESA #9383831 for sale

AMAT / APPLIED MATERIALS Centura DPS G5 MESA is a high-performance physical vapor deposition (PVD) equipment designed for tungsten barrier and contact applications. This system enables the production of advanced semiconductor devices such as metallic contacts, low-k dielectric films, and refractory metal nitride and oxide barrier layers. Featuring advanced capabilities, the unit provides optimal uniformity and repeatability of film structure and stresses, thus helping to improve process yield. AMAT Centura DPS G5 MESA encompasses a highly advanced vacuum chamber with a multi-zone technology. It features advanced thermal management designs that allow to achieve less than 1 ppm of target gas deposition rate. The machine utilizes a single, integrated tool architecture that enables maximum throughput while ensuring repeatability. In addition, there is a low cost-of-ownership concept, with only three components and no extra gas or heating requirements. The DPS G5 MESA utilizes multiple magnetrons to created a five-zone lateral diffusion shield (LDS) which can be configured to optimize film uniformity, rate of deposition, and stress state of the films. The asset is also equipped with an in-situ performance cell and a deposition monitoring model that allows for good process control. APPLIED MATERIALS Centura DPS G5 MESA provides a high-speed, cost-effective solution for the manufacture of advanced semiconductor devices. The equipment enables both single slot and double slot deposition processes, allowing for improved productivity. The system also provides excellent temperature control to help maintain the desired deposition rate and film uniformity. Its multi-zone thermal management capabilities ensure that the temperature of the chamber and the target remain stable, thus providing improved process repeatability. The advanced LDS design offers robust uniformity and improved repeatability of films. Centura DPS G5 MESA enables accurate and efficient barrier and contact deposition processes for the manufacture of advanced semiconductor devices. The unit combines cutting-edge technologies to deliver improved throughput, increased uniformity, and better overall process control. Its advanced LDS design ensures uniform film formation and its integrated performance cell and deposition monitoring machine allows for accurate control of the deposition process. This tool is a cost-effective solution for the manufacturing of advanced semiconductor devices and can provide consistent, repeatable performance in volume production.