Used AMAT / APPLIED MATERIALS Centura DPS G5 MESA #9411952 for sale

AMAT / APPLIED MATERIALS Centura DPS G5 MESA is a multi-chamber, high temperature plasma enhanced chemical vapor deposition (PECVD) reactor. It is designed to improve the efficiency and reliability of high temperature and high pressure processes such as those used in semiconductor fabrication. The reactor is designed to deposition layers of silicon and other materials at temperatures ranging from >950°C down to room temperature while using high pressure and low pressure plasma respectively. The reactor utilizes a simultaneous three-chamber configuration, allowing for processing of multiple wafers or substrates in a sequential fashion. It is also built with an automatic exhaust quench system to ensure process stability and is equipped with a mini-loadlocks enabling the loading and unloading of multiple wafers. The reactor uses microwave power, applied on the top deck with a Magnetron mounted on a 2" turntable, and radio frequency (RF) power directed to the substrate through an acidic mass-loaded line (MLL) connected to the reactor's lower decks. The reactor has a quadruple frequency generator, providing power from 13.56 MHz to 60 MHz, as well as a triple source gas delivery system, with a standard four-valve source gas box for etching processes and three independent sources for reactant gases. The reactor is also capable of utilizing Nitrogen and Oxygen End Point Detection (EPD) during deposition, providing better control over the process endpoint and allowing deposition operation with higher precision. The reactor's chamber is constructed using 304 stainless steel, with the interior walls and base coated with a wear-resistant ceramic and fused silica insulator respectively. A cooled shower plate is installed on the upper section of the chamber to provide uniform cooling of the process gas, and a removable top plate permits easy access to the chamber for maintenance and fabrication. Additionally, two quartz viewports permit the viewing of the process. AMAT Centura DPS G5 MESA reactor is designed for extremely precise deposition processes and has a proven track record in the semiconductor industry for its improved performance and reliability. It is capable of producing high quality layers of silicon, aluminum, and other materials at temperatures from >950°C down to room temperature, and is suitable for use in applications such as high-k, low-k dielectrics, and metal gate stacks. Furthermore, it offers a cost-efficient method of depositing layers, enabling the fabrication of a wide variety of semiconductor devices.