Used AMAT / APPLIED MATERIALS Centura DPS G5 #9188280 for sale

AMAT CenturaTM DPS G5 is a revolutionary PVD reactor designed to carry out various thin film deposition processes. This reactor offers excellent process capability and productivity for the deposition of continuous films, liner films, or alternating layers of multiple materials. It can be used for a variety of applications such as hardmask and etch stop layers, barrier and diffusion layers, and reflective layers. AMAT / APPLIED MATERIALS Centura DPS G5 reactor is based on the traditional DPS technology. This equipment offers a more robust and reliable platform than other reactors and operates with high throughput up to 250⅙ wafer inputs. The reactor is designed to reduce cycle time and minimizes metal loss on each cycle, providing a more cost-efficient solution. It equips with process chamber and gas delivery systems, along with sophisticated mechanical, electrical, and software systems that control the process parameters. The reactor features a high-performance, digital, DC power source with high control stability and repeatability, which is essential for reliable thin film depositions. It also equips with an easy-to-use, user-friendly, PC-interfaced, and monochromator-controlled system with three-dimensional rotatory stage for target source positioning. This allows precise target orientation for optimal film uniformity and conformal coverage along all surfaces of the wafers. The reactor also provides an extensive range of process chambers to suit a variety of process applications. These chambers are constructed of stainless-steel vessels with the option of a single or dual top and use quartz bell jar technology to minimize redeposition of previously evaporated molecules and particles. The unit also supports various heating and cooling options for substrate preheating and cooling during processing for increased throughput, uniformity, and yield. The reactor operates with several process gases in order to achieve specific film properties. It includes a fully automated and programmable gas delivery machine, which is capable of supporting up to eight reactive gases and up to four inert gases. The pressure control of the chamber is constantly adjustable and efficiently managed to maintain the optimal process conditions. AMAT Centura DPS G5 offers integrated in-situ and ex-situ metrology for process control and optimization . This tool is fully digitally compatible, enabling remote access for a better control of the asset state and facilitates more efficient workflow.