Used AMAT / APPLIED MATERIALS Centura DPS G5 #9188281 for sale

AMAT / APPLIED MATERIALS Centura DPS G5 is a thin-film deposition reactor designed for high volume production of advanced technologies devices. It is an industry-leading tool for the deposition of thin films, such as polysilicon, silicon oxide, and other metal oxides, as well as dielectrics and passivation layers. The G5 is an atmospheric-pressure, dual-platen, linear-directed physical vapor deposition (LDPVD) platform that utilizes a unique two-chamber technology, allowing for precise and repeatable deposition. The equipment features a single-source technology with a wide-range gas delivery system, enabling versatile production of thin-film materials. Both chambers of the G5 chamber are equipped with automated shutters, allowing for excellent uniformity in both chamber conditions and also more efficient material processing. The G5 also has a unique, patent-pending cold-trap feature, capturing substrate contaminants during deposition and allowing for cleaner and more efficient production of thin-film materials. The high-resolution, automated shutter control of the G5 enables synchronized exposure of multiple wafers to the same deposition conditions. This ensures unmatched process repeatability and uniformity. In addition, the G5 is capable of rapid thermal cycling, enabling faster processing of films and fewer re-deposition steps. This leads to higher throughput and lower cost of ownership. The G5 also features a precision load-lock unit, allowing for rapid wafer loading and unloading, as well as excellent throughput. With an AC-power supply, the machine has the power to rapidly reach and maintain temperatures. The tool is also equipped with a low-power radio frequency array, allowing for high-density thin-film processing and eliminating contamination due to in-flight particles. AMAT Centura DPS G5 is an advanced, high-performance reactor capable of producing high-quality thin films. With its unsurpassed process repeatability, uniformity, and efficient material processing, the G5 is the reactor of choice for high volume production of advanced materials for next-generation devices.