Used AMAT / APPLIED MATERIALS Centura DPS G5 #9188282 for sale

AMAT / APPLIED MATERIALS Centura DPS G5 reactor is a high-end, fully automated plasma-enhanced chemical vapor deposition (PECVD) equipment designed to meet the demanding needs of semiconductor device fabrication. It offers both advanced substrate handling features and an intuitive user interface, allowing users to quickly and conveniently bring their processes online. The system's chief advantage is its ability to deposit materials in multiple layers in sequence and on large substrates, enabling highly efficient production of integrated circuits and other components. AMAT Centura DPS G5 features a wide array of power sources, enabling operation with a variety of gases, including nitrogen, hydrogen, oxygen, arsine, silane, and tetrakis-dimethyl-ammonium-silane. Power levels can be easily adjusted from 10 to 1200 Watts, allowing for precise deposition rates and material uniformity. The field emitters provide precise and efficient control over the substrate position, enabling high precision processing. The parallel-electrode unit is designed to allow for uniform thickness of multiple layers in a single run. To ensure optimal process quality, the machine features real-time process monitoring, remote access, and sophisticated data-logging capabilities. This enables users to track and pinpoint any process parameters that may require further improvement. APPLIED MATERIALS Centura DPS G5 also includes AMAT Process Control Suite, providing a comprehensive suite of user-friendly graphical tools to further optimize processes. Centura DPS G5 is built for high-volume production runs, offering superb substrate handling and reliable operation. Its reliability ensures that the tool can continually meet demanding cycle-time requirements while producing defects-free parts. The asset also features various safety features, including automatic shut-down capabilities in case of emergency. Overall, AMAT / APPLIED MATERIALS Centura DPS G5 reactor is an advanced model designed to provide reliable and precise PECVD capabilities. Its precision and accurate process control allows for high-quality production of integrated circuits and other components, and its sophisticated remote data logging capabilities enable users to continuously monitor and optimize processes.