Used AMAT / APPLIED MATERIALS Centura DPS G5 #9309116 for sale

AMAT / APPLIED MATERIALS Centura DPS G5
ID: 9309116
Wafer Size: 12"
Vintage: 2007
Etcher, 12" Process chamber Mesa chamber 2007 vintage.
AMAT / APPLIED MATERIALS Centura DPS G5 is a dedicated plasma reactor designed for high-volume production of advanced nanometer structures and device features. It is an all-in-one, self-contained platform combining the two vacuum processing technologies of surface activation and plasma deposition in a single cluster-enabled equipment. AMAT Centura DPS G5 reactor consists of various components, such as a low-pressure plasma source, a features display, wafer transport, environmental system, and chemical delivery unit. The low-pressure plasma source is used to produce the reactive species used in plasma processing. It can be fired up to an operating pressure of 4 mtorr. The features display, including power supply and frequency controls, is used to tune the plasma reactor for optimum operation. This display also allows for complete customization of the reactor's parameters. The wafer transport section of APPLIED MATERIALS Centura DPS G5 is designed to safely and reliably transport wafers from the wafer loader to the plasma chamber while maintaining optimal thermal performance. This transport also includes the glovebox interface with the wafer-loaded cassette, vacuum isolation valves, and optical sensing. The environmental machine of Centura DPS G5 provides reaction gases, adaptive plasma power control, background gas switching, and recipes in a fully automated and simple-to-use tool. This asset ensures the highest quality and most repeatable plasma etch processes. The chemical delivery model of the DPS G5 is composed of chemical dosing manifolds and is capable of precise chemical supply to the production area. AMAT / APPLIED MATERIALS Centura DPS G5 provides repeatable and controllable processes at an efficient cost due to its robust micro substrate platform and dual vacuum processing technologies. This reactor enables quick etching, deposition, and cleaning of metals, oxides, nitrides, and more with accurate precision at an industry-leading rate. Its user-friendly control panel, full software integration, and network connectivity makes it possible for users to maintain a consistent process in an easy to access interface.
There are no reviews yet