Used AMAT / APPLIED MATERIALS Centura DPS G5 #9379820 for sale

AMAT / APPLIED MATERIALS Centura DPS G5 is a high-performance reactor designed to maximize productivity and reduce costs. It is a single wafer, high productivity, inline equipment that utilizes Dual Plasma Source (DPS) technology. The system is based on the dual-frequency, RF-driven plasma source, which is capable of generating high-density plasmas at high pressures and temperatures. The DPS technology helps to create different gas profile distributions of the plasma across the wafer. The dual-gas injection unit helps to ensure uniformity and patterning, increasing etch uniformity across the wafer. The machine also has an integrated plasma monitoring and control tool that helps to maintain a consistent profile. The reactor is also designed with a modular architecture, allowing it to be configured and reconfigured to accommodate different process requirements. This modular design also helps to reduce downtime and accelerate process development. The reactor also has a wide range of process capabilities, from low pressure processes to high power processes. Its modular design also allows for multiple configurations and process options, making it an ideal tool for production and development. AMAT Centura DPS G5 is an ideal tool for advanced applications that require high precision, high throughput and uniformity across the wafer.