Used AMAT / APPLIED MATERIALS Centura DPS G5 #9379822 for sale

AMAT / APPLIED MATERIALS Centura DPS G5 Reactor is a high-power processing tool used in semiconductor device fabrication. It is capable of high-speed etching and deposition of materials onto substrates, making it ideal for producing extremely intricate features. The G5 Reactor is a hybrid, dual beam, direct plasma source (DPS) reactor that combines an inductively-coupled plasma (ICP) source with a microwave-excited capacitively-coupled plasma (CCP) source. The G5 is equipped with a powerful microwave generator providing up to 5 kW of energy. The microwave beam is then focused on the substrate, creating a plasma with very uniform ion energy and particle size. This uniformity is important to ensure consistent etch and deposition results. The DPS architecture of the G5 reactor further ensures a stable and precise microwave plasma. The G5 also has a wide range of gas control features to ensure an ideal processing environment for etching and deposition. The gases used in the G5 include NF3, O2, Ar, O2/N2, and H2. By carefully controlling the flow of these gases, the G5 produces higher quality etch and depositions than could be achieved using traditional processes. The G5 reactor also features a variety of advanced safety features, such as an automated, fail-safe, microwave shut-off system to ensure maximum safety and operation reliability. It is also designed to minimize contamination from process byproducts, further improving yields and product quality. In conclusion, AMAT Centura DPS G5 Reactor is a powerful and reliable tool that is well-suited for the fabrication of high-quality semiconductor devices. With its dual-beam DPS architecture, wide range of gas control features, and numerous safety systems, the G5 is one of the premier reactors on the market for semiconductor device fabrication.