Used AMAT / APPLIED MATERIALS Centura DPS I #9116831 for sale

AMAT / APPLIED MATERIALS Centura DPS I is a single wafer reactor designed for high performance diffusion and oxidation processes used for low temperature semiconductor and device applications. The reactor utilizes an innovative dual-permeability gas delivery equipment to ensure optimal uniformity, total mass transport, and precise control over process parameters. The platform was created with the intention of simplifying the workload while maintaining desired yields. AMAT Centura DPS I reactor enclosure and chamber system are constructed of stainless steel with no electrical current contact from essential process components. The dimensions of the centura unit measure a total width of 950 mm, a total height of 796 mm, and a total depth of 959 mm. The total inside chamber size of APPLIED MATERIALS Centura DPS I is at a diameter of 505 mm and a length of 610 mm. The chamber of the reactor measures at 560°C and 6 x 10-4 Torr. The total load capacity of the machine is 20 kg including the wafer cassette and the maximum load uniformity is ±0.3°C. Centura DPS I is made to further optimize user convenience with features such as dual showerhead mass transport, configurable zone function, advanced gas purge modes, Process Manager software, Easy Processing Maintenance, and Vacuum Process Monitor. AMAT / APPLIED MATERIALS Centura DPS I reactor is equipped with the patent-pending dual-showerhead mass transport tool, which supplies separately controlled gas flows to each showerhead while the Centura reactor is in operation. This two-in-one gas flow asset allows for process uniformity by providing exactly controlled and equal total mass transport of reactive gas at each downward showerhead. AMAT Centura DPS I reactor also has a configurable zone function that further enhances process programs by allowing operators to set up up to three separate gas flow zones with digital display of each separate zone's temperature, flow, and pressure settings. The advanced gas purge modes allow for precision, reduction in purge time, and improved thermal consistency. The Process Manager software makes control of user interfaces easier and more intuitive, allowing for the creation and manipulation of recipes without the need for recoding. The Vacuum Process Monitor ensures that process results are consistent by utilizing an advanced generator to measure vacuum throughout the entire process with real-time monitoring. Additionally, Easy Processing Maintenance and its onboard diagnostics make it easy for operators to diagnose and troubleshoot the reactor issue. APPLIED MATERIALS Centura DPS I is a powerful single-wafer reactor designed for high-precision diffusion and oxidation processes for low-temperature semiconductor and device applications. With its dual-permeability gas delivery model, configurable zone function and advanced gas purge modes, Centura DPS I reactor is capable of providing precisely controlled and uniform process parameters, maximizing user convenience and yields.