Used AMAT / APPLIED MATERIALS Centura DPS I #9358215 for sale

AMAT / APPLIED MATERIALS Centura DPS I is a chemically-isolated, high-performance deposition and etch reactor equipment designed to streamline the fabrication of advanced microelectronic devices. The system enables high-throughput and reliable epitaxial growth of compound semiconductor materials. It combines the advantages of atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes in a single unit to give end-users unmatched etch and deposition control. The machine features advanced process control and metrology modules to guarantee precise and repeatable fabrication of complex device structures on advanced substrates. AMAT Centura DPS I is built for rapid thermal processing, atomic layer deposition, and chemical vapor deposition applications. With a wide range of process capability, the versatility of the platform makes it ideal for fabrication of a wide range of microelectronic devices, including memory, logic, and power-like devices. The tool utilizes an effective conveyor mechanism that supports multiple recipe executions simultaneously, making it an ideal choice for high volume production. APPLIED MATERIALS Centura DPS I reactor features a vertically arranged Reaction Chamber (RFV) with a volumetric volume of up to 8 liters. It is enclosed by six electric boards, each connected to the other using a modular architecture that has been designed to simplify both asset and process maintenance. The entire model is enclosed in a hermetically sealed environment that can be adjusted to accommodate temperatures of up to 170°C and a reduced pressure of less than 1.5 mTorr. The reactor has an integrated Mass Flow Controller (MFC) that is powered by an intelligent equipment-level control system that operates using distributed intelligence. This allows the reactor to achieve precise thermal control over an expansive range of temperatures, with the minimum achievable steps being as small as 10 mK/min. The unit also offers a programmable pulse mode and an integrated Intelligent Q control design for unparalleled etch process control. The reactor machine also uses a two-chamber gas shadowing and purging tool, which protects the substrate while providing high-uniformity control of the etch/deposition surface. The asset's advanced software also provides the user with wafer mapping capabilities, predictive Q control, and automated wafer tracking from load port to load port. Centura DPS I is an exciting tool that offers its users the ability to drive their chip performance and efficiency, and deliver best-in-class yields. With its repeatable, reliable, and uniform deposition and etch capabilities, this model has proven itself to be an invaluable asset for chip fabrication facilities and wafer-scale production.