Used AMAT / APPLIED MATERIALS Centura DPS II AE Mesa HP #9314662 for sale
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ID: 9314662
Wafer Size: 12"
Etcher, 12"
Poly etch
(3) DPS II Chambers
Axiom chamber
RF Gen rack
AC Rack
Missing parts:
KAWASAKI ATM Robot EFEM
Buffer chamber ( VHP Robot)
Turbo pump.
AMAT / APPLIED MATERIALS Centura DPS II AE Mesa HP is a highly advanced wafer processing reactor designed for optimal speed and accuracy. It utilizes a multi-zone chamber design to provide uniform heating and deposition of materials, ensuring consistent results. The process chamber features an integrated table with around three horizontal zones for up to six individual circles cooling solutions with independent temperature control. This table enables simultaneous processes, enabling users to achieve higher throughput and faster cycle times. The reactor chamber is surrounded by a vacuum manifold. The design of the manifold ensures that the process is performed in a vacuum which allows an even deposition and etching of the wafers. The chamber is further equipped with a gas injection equipment to provide process gas in exact quantities and ratios along the measured process temperatures. AMAT Centura DPS II AE Mesa HP also comes equipped with an AMAT Control System, which allows process engineers to create individual recipes for different installations. It also provides real-time monitoring of process conditions and enables process optimization. Additionally, the unit is equipped with safety features to ensure compliance with required safety standards. This reactor also provides high accuracy and provides uniformity in the thickness of the deposited and etched materials. It also offers excellent repeatability and a high level of process control to improve yields in the wafer production process. In conclusion, APPLIED MATERIALS Centura DPS II AE Mesa HP is designed to deliver high-performance wafer processing with uniform heating, deposition, and etching. This reactor is equipped with a vacuum manifold, gas injection machine, and control tool, giving users a powerful tool to deliver uniform and repeatable processes. Additionally, this reactor is designed for maximum process safety, accuracy, and yields.
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