Used AMAT / APPLIED MATERIALS Centura DPS II AE Minos #9366381 for sale

AMAT (APPLIED MATERIALS/APPLIED) AMAT / APPLIED MATERIALS Centura DPS II AE Minos Reactor is a fully automated electro-chemical etching equipment designed for semiconductor device fabrication. The system consists of a gel-based plasma source capable of providing high selectivity and superb etch uniformity. It features an Ultra-High Vacuum (UHV) processing chamber, a multiple wafer cassette loader, and a high vigor pool of processes to provide reliable, repeatable results. The UHV processing chamber is equipped with a single wafer loadlock, designed for loading wafers up to 8 inches in diameter and up to a maximum of 15. The chamber has a tolerance for operating pressures between 1.3 x 10-3 torr and 150 torr, meaning that it maintains a clean environment to maximize the uniformity of etch results. The multiple wafer cassette loader unit enables the centering, tracking, and movement of single wafers automatically, providing high speed loading and unloading of wafers up to 8 inches wide. Additionally, a thermal switching gate valve allows for fast loading and unloading of multiple wafer lots while maintaining process vacuum. AMAT Centura DPS II AE Minos Reactor is designed to etch effectively and safely. It offers an expanded list of etch chemistries, enabling complete variability in etch parameters. It is backed by a dedicated automation layer to optimize process recipes and ensure repeatable performance. The machine has an in-built gas control valve to optimize etch rate and sidewall angle, while user-friendly plasma source control offers additional flexibility to current etch processes. In addition, APPLIED MATERIALS Centura DPS II AE Minos Reactor comes with numerous safety features. It is equipped with an Advanced Process Control (APC) tool to prevent runaway conditions due to unexpected events, as well as various visual alarms and warning systems designed to alert personnel to potential issues. Moreover, the asset integrates a multiple-level safety gate model to prevent unexpected reactions and reactions to foreign materials. In conclusion, AMAT / APPLIED MATERIALS (AMAT/APPLIED) Centura DPS II AE Minos Reactor is a robust, fully automated electro-chemical etching equipment designed for highly precise semiconductor device fabrication. It offers a wide range of etch chemistries and process parameters, coupled with a reliable safety system and dedicated automation layer for repeatable results.