Used AMAT / APPLIED MATERIALS Centura DPS II AE Poly G3 #9195071 for sale

Name: AMAT / APPLIED MATERIALS Centura DPS II AE Poly G3
Brand: AMAT / APPLIED MATERIALS
SKU: 9195071
Availability: InStock

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Photo Used AMAT / APPLIED MATERIALS Centura DPS II AE Poly G3 For Sale

Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Centura DPS II AE Poly G3

ID: 9195071

Wafer Size: 12"

Vintage: 2007

Poly etcher, 12" (3) Process chambers Factory interface configuration Front end PC type: 4.0 FEPC FIC PC Type: CPCI (3) Load ports A3 Type: Atmospheric robot KAWASAKI single fixed robot Side storage: Right and left Mainframe configuration IPUP Type: ALCATEL A100L Gas panel type: Standard VHP Robot: Dual blade MF PC Type: CL7 Chamber configuration: Chamber A: Chamber model: DPS II Poly Bias gen: AE APEX 1513, 13.56 MHz Bias match: AE 13.56 MHz, 3 kv navigation Source gen: AE APEX 3013, 13.56 MHz Source match: AE 13.56 MHz, 6 kv navigation Turbo pump: STP-A2503PV Throttle valve: VAT Pendulum valve DN-320 FRC: MKS FRCA-52163310 ESC: Dual zone ceramic ESC End point type: EyeD IEP Chamber B / C: Chamber model: DPS II Poly Bias gen: AE APEX 1513, 13.56 MHz Bias match: AE 13.56 MHz, 3 kv navigation Source gen: AE APEX 3013, 13.56 MHz Source match: AE 13.56 MHz, 6 kv navigation Turbo pump: STP-A3003CV Throttle valve: VAT Pendulum valve DN-320 FRC: MKS FRCA-52163310 ESC: Dual zone ceramic ESC End point type: EyeD IEP Missing parts: AXIOM Chamber RF Source VODM Throttle valve 2007 vintage.

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AMAT / APPLIED MATERIALS Centura DPS II AE Poly G3 is a highly advanced plasma etching reactor designed for use in the semiconductor industry. This reactor is particularly well-suited to processes involving sub-500nm high-aspect ratio features, making it ideal for the demands of the most modern chip designs. The reactor is part of the Centura DPS II series and features a modular design that enables it to meet a variety of applications as requirements evolve from process optimization. The reactor contains a WF-loadable vessel, meaning that various options such as non-standard wafer sizes or quartz orientations can be supported. The reactor is powered by an advanced AMAT Endura 5500 power delivery system delivering superior performance with precise control and high uniformity. This enables customers to achieve both high etch rates and excellent repeatability of results with each batch. The power delivery system also features multi-frequency flexibility that the user can adjust to their specific needs. The reactor has a silicon-based gate compatibility and is compliant with the 300mm standards, making it suitable for a wide variety of chip designs. It is also engineered with advanced features such as an integrated pump and gas analyzer system to maximize performance and operational efficiency, which ensures that process windows can be optimized to achieve the highest yield. The reactor is available with several options and features, such as a substrate chuck set, optional source lamps, and plasma monitoring systems. It also features built-in safety mechanisms to ensure that optimal safety and productivity is maintained at all times. AMAT Centura DPS II AE Poly G3 is a highly advanced and reliable reactor designed to meet the needs of the semiconductor industry. It offers superior performance and flexibility and features a modular design tailored to meet specific application requirements. It is suitable for designs ranging from sub-500nm features to 300mm chips. This makes it a great choice for all types of semiconductor applications.