Used AMAT / APPLIED MATERIALS Centura DPS II Mesa T2 #9284377 for sale

AMAT / APPLIED MATERIALS Centura DPS II Mesa T2 is a multi-reactor equipment that is designed for advanced doping and etching processes in the semiconductor industry. It's built on AMAT high-performance titanium nitride (TiN) T2 process technology platform, which enables extremely fast, efficient, and economical processing of various contact, gate, and trench structures. The system consists of several components - a single wafer reaction chamber, a remote plasma source, and two additional reaction chambers configured for multiple dopant and etchant applications. The chamber is equipped with a high-temperature oven, programmable gas controls, pressure control, and multiple electrodes and wafer lifters for a uniform, repeatable deposition process. AMAT Centura DPS II Mesa T2 unit offers users several key advantages. It performs a highly efficient, cost-effective, and uniform deposition process that can be used for various doping and etching applications, including wafer cleaning and oxide deposition. The machine also features variable gas flow and pressure settings to enhance process precision and repeatability. In addition, the unit is designed with multiple process electrodes that help minimize the risk of field inversion and maximize the throughput and uniformity of processing. The tool accommodates both single and multiple platform processing, allowing customers to customize their process options. APPLIED MATERIALS Centura DPS II Mesa T2 also provides a complete environment for dopant and etching management. This includes a fully automated asset for dopant monitoring and process control, integrated etchant chamber monitoring, and real-time model management. The equipment also offers multiple process control modules, including manual, semiautomatic, and closed loop control options that can be configured to each customer's individual needs. Overall, Centura DPS II Mesa T2 is an advanced reactor system that offers users an efficient, cost-effective, and uniform deposition process. With its high-performance titanium nitride process platform, multiple process control modules, and integrated dopant and etching monitoring capabilities, customers can trust the unit to deliver reliable, repeatable results for their semiconductor applications.