Used AMAT / APPLIED MATERIALS Centura DPS II #293660388 for sale

AMAT / APPLIED MATERIALS Centura DPS II is a single wafer processing system that provides the highest throughput and repeatability in the market, designed to reduce process times, improve yields and increase yields and reduce complexities for a wide range of semiconductor applications. The technology enables further scaling of semiconductors and advancements in advanced transistor structures while offering superior device performance. AMAT Centura DPS II features a 55mm wafer footprint, a maximum wafer diameter of 155mm, and a maximum wafer thickness of 4.26mm. With the advanced wafer handling and adaptive control scheme of APPLIED MATERIALS CENTURA DPS+ II, wafer-level processes can be accomplished with superior repeatability. APPLIED MATERIALS Centura DPS II reactor is suitable for high-speed processes such as ultrafast anneals, low temperature anneals, drive-in, and low temperature dopants, making it an ideal tool for advanced device development. It also offers support for high-sensitivity materials such as SiC and GaN, allowing users to work with these materials in a temperature and power envelope that meets their respective requirements. The dedicated high-efficiency plasma source on Centura DPS II provides the highest plasma, temperature, and process uniformity across the entire chamber setpoint and wafer temperature range. This allows users to leverage high plasma density, high temperature uniformity, and process consistency over wide ranges of wafer size. The plasma is applied through an oxide-shielded aperture to ensure dead-time free operation. The independent multi-mode RF generators provide robust control over the atmospheric pressure and plasma power. The comprehensive in situ sensor package in AMAT CENTURA DPS+ II enables users to monitor the temperature, pressure, and gas profile of their chamber real-time, which helps to achieve the highest yield with a minimum of interruption. The integrated advanced controls of the reactor further enhance the repeatability and reliability of operations. In addition, the programmable pulse control feature maximizes the speed of operations and minimizes the dwell time. Overall, CENTURA DPS+ II reactive system offers the highest throughput and repeatability available in the semiconductor market today. With its advanced wafer handling, excellent plasma source, and comprehensive in situ sensor package, AMAT / APPLIED MATERIALS CENTURA DPS+ II allows users to take full advantage of their semiconductor development and fabrication capabilities.