Used AMAT / APPLIED MATERIALS Centura DPS II #9116829 for sale
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ID: 9116829
Metal system
Load lock: wide
Chamber A, B: DPS+ metal
Chamber C, D : ASP+
Chamber E: fast cool down
Chamber F: orient
Robot: VHP+.
AMAT / APPLIED MATERIALS Centura DPS II reactor is an advanced semiconductor production equipment equipment utilizing rapid thermal processing, allowing for significantly increased production throughput. This state-of-the-art tool offers industry-leading wafer processing capabilities, for the purpose of epitaxy and deposition of compound films. It can process both single-wafer and batch configurations up to eight inches (200 mm) in diameter, and is also compatible with up to four wafer carriers per job. The tool offers a number of standard options and custom upgrade options, ensuring it can be tailored to meet the requirements of the specific application. AMAT Centura DPS II uses proprietary advanced process flow algorithms to help ensure the highest level of performance and reliability. It also features an advanced quartz-enhanced deposition system for improved process uniformity and layer properties. This unit can be easily customized for other deposition applications. The tool also offers an innovative high-speed wafer transfer machine, allowing job runs to be completed quickly and efficiently. One of the key advantages of APPLIED MATERIALS CENTURA DPS+ II is the fast reaction time. This is due to the advanced Infrared heaters, which offer precise control, allowing for precise and repeatable temperatures without the need for complex temperature stabilization processes. The tool also features a precision wafer chucking tool, allowing for accurate alignment and deposition of layers without damaging valuable wafers. This greatly reduces overall process time and eliminates the need for costly wafer reconditioning. Another key feature of CENTURA DPS+ II is the comprehensively designed environmental protection asset. This model uses multiple technologies, including thermal management and flushing, to minimize contamination and keep critical components dry. This helps ensure a fully optimized production environment for multiple types of wafers and films. The equipment also features an interlocking support structure, providing the highest level of fabrication stability and reliability. In addition, an extensive cleaning system is available to help eliminate stray particles and to reduce the risk of defects during manufacturing. All of these features combine to make APPLIED MATERIALS Centura DPS II one of the most advanced production-level reactor systems on the market, offering high levels of reliability, repeatability, efficiency, and cost savings. It is suitable for large-scale production applications, and is capable of meeting the most exacting requirements of modern semiconductor production.
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