Used AMAT / APPLIED MATERIALS Centura DPS II #9198121 for sale

AMAT / APPLIED MATERIALS Centura DPS II is a plasma/reactive ion etch (RIE) tool that provides full depth and profiling capabilities in semiconductor production. It is particularly well-suited for deep etch applications because of the combination of its power and flexibility. AMAT Centura DPS II system is composed of three main modules, including the chamber, the power source and the control unit. The chamber module contains two chambers, an etch chamber and a plasma generator chamber. Both of these are zoned, allowing for the use of multiple gas types, pressures, and temperatures. The power source module provides precise RF power to the plasma, allowing for high etch rates. Lastly, the control unit allows for full computer control of the chamber, power source, and recipe parameters. The tool is designed for high reliability and repeatability, making it suitable for production runs. It also has a full range of protectors and sensors that help ensure a clean operation. Its wide range of process parameters also allows for the operation of multiple processes in parallel. These include processes such as dry etches, plasma and reactive deposition, substrate heating, and substrate cooling. APPLIED MATERIALS CENTURA DPS+ II is an etcher that is suitable for etching on various materials, including semiconductor wafers, photoresists, thin films, and glass. It uses a variety of gases, including chlorine, fluorine, oxygen, argon, and nitrogen to etch various materials. It is capable of etching through film stack structures up to two microns deep. Its wide range of process parameters can also be adjusted for the etching of very thin films. The tool is very easy to use, as it has a full range of recipes and an intuitive graphic user interface that allows users to adjust process parameters quickly and easily. It also has a quick recipe changeover, which allows the user to quickly switch from one recipe to another. It is therefore very well suited for production runs. In conclusion, CENTURA DPS+ II is a versatile, reliable, and powerful plasma/etching tool, offering precision etching capabilities for a wide range of materials and etching types. It has a wide range of process parameters that can be adjusted for precise etching of even very thin layers, as well as a quick recipe changeover and an intuitive user interface. Therefore, AMAT CENTURA DPS+ II is a good choice for semiconductor production in which precision etching is desired.