Used AMAT / APPLIED MATERIALS Centura DPS II #9213077 for sale

Name: AMAT / APPLIED MATERIALS Centura DPS II
Brand: AMAT / APPLIED MATERIALS
SKU: 9213077
Availability: InStock

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Manufacturer

AMAT / APPLIED MATERIALS

Model

Centura DPS II

ID: 9213077

Poly etchers Chamber A, B, C: Model: DPS II Bias generator: AE Apex 1513 13.56 MHz, maximum 1500 W Bias match: AE 13.56 MHz, 3 kV Navigate Source generator: AE Apex 3013 13.56 MHz, maximum 3000 W Source match: AE 13.56 MHz, 6 kV Navigation Lid: Ceramic lid, dual gas nozzle Turbo pump: EDWARDS STP-A3003 CV Throttle valve: VAT Pendulum valve DN-320 FRC: MKS FRCA-52163310, 500/500 1/4 VCR ESC: Dual zone ceramic ESC Cathode chiller: SMC POU Wall chiller: SMC INR-496-016C Process kit coating: Anodize coating Cooling: HT 200 / FC 40 Chamber D: Model: Axiom Source generator: 5000W Source match: AE Match (RF System) Throttle valve: Throttling gate valve ESC: Pedestal heater Mainframe configuration: IPUP Type: TOYOTA 100L Gas panel type: NextGen VHP Robot: Dual blade MF PC type: CPCI Factory interface configuration: Frontend PC type: 306 M Server FIC PC Type: 306 M Server (3) Load ports Atmospheric robot: KAWASAKI Single fixed robot (A3 Type) Side storage: Right and left side MFC Configuration: EAS-52A Gas name Max flow MFC type Gas 1 CL2 300 SC-24 Gas 2 NF3 50 SC-23 Gas 3 SF6 100 SC-24 Gas 4 HBR 500 SC-24 Gas 5 N2_20 20 SC-21 Gas 6 N2_200 200 SC-23 Gas 7 O2_50 20 SC-22 Gas 8 O2_400 400 SC-24 Gas 9 HE 500 SC-24 Gas 10 CHF3 200 SC-24 Gas 11 CF4 300 SC-24 Gas 12 AR 500 SC-24 EAS-52B Gas name Max flow MFC type Gas 1 CL2 300 SC-24 Gas 2 NF3 50 SC-23 Gas 3 SF6 100 SC-24 Gas 4 HBR 500 SC-24 Gas 5 N2_20 20 SC-21 Gas 6 N2_200 200 SC-23 Gas 7 O2_50 20 SC-22 Gas 8 O2_400 400 SC-24 Gas 9 HE 500 SC-24 Gas 10 CHF3 200 SC-24 Gas 11 CF4 300 SC-24 Gas 12 AR 500 SC-24 EAS-52C Gas name Max flow MFC type Gas 1 CL2 300 SC-24 Gas 2 NF3 50 SC-23 Gas 3 SF6 100 SC-24 Gas 4 HBR 500 SC-24 Gas 5 N2_20 20 SC-21 Gas 6 N2_200 200 SC-23 Gas 7 O2_50 20 SC-22 Gas 8 O2_400 400 SC-24 Gas 9 HE 500 SC-24 Gas 10 CHF3 200 SC-24 Gas 11 CF4 300 SC-24 Gas 12 AR 500 SC-24 EAS-52D Gas name Max flow MFC type Gas 1 - - - Gas 2 - - - Gas 3 - - - Gas 4 - - - Gas 5 - - - Gas 6 - - - Gas 7 O2 10000 SC-27 Gas 8 4%H2/N2 5000 SC-26 Gas 9 - - - Gas 10 N2 1000 SC-25.

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AMAT / APPLIED MATERIALS Centura DPS II is an in-situ plasma processing reactor equipment designed for sophisticated plasma-assisted deposition and etching operations. The system provides high-precision thermal and plasma control required for advanced device fabrication. AMAT Centura DPS II is built from the ground up to provide reliable and repeatable process results. The unit offers precise control of process parameters such as temperature, pressure, RF power, and gas flow and mixture. It is a source-doped reaction chamber, and it features a robust power supply that allows for seamless transitions between high- and low-power settings. The machine also features a gas-cooled substrate holder for control of substrate temperature, and a digital probe that measures real-time process conditions inside the chamber. APPLIED MATERIALS CENTURA DPS+ II is also an intuitive tool and can be programmed and monitored in real-time. RF power and gas flow settings can be adjusted with a touchscreen graphical interface, and various process parameters can be monitored and logged throughout the process. The asset can also be integrated with a PC or PLC for automated control. APPLIED MATERIALS Centura DPS II is a powerful tool for these applications and is capable of producing devices with extremely high yields while still maintaining excellent device performance. The model also offers a range of advanced safety features, including overpressure alarms and gas mixing monitors, to ensure safe and controlled operations. With its easy setup and user-friendly interface, AMAT / APPLIED MATERIALS CENTURA DPS+ II is an excellent choice for those seeking precise process control and consistent results.