Used AMAT / APPLIED MATERIALS Centura DPS II #9223550 for sale

AMAT / APPLIED MATERIALS Centura DPS II is an advanced process Chemistry diffusion reactor that can be used for a wide range of semiconductor fabrication processes. This multi-functional reactor offers a highly efficient, programmable way to achieve high-quality results. It is designed for 100 mm, 110 mm, 200 mm, and 300 mm wafer size substrates. AMAT Centura DPS II features an advanced gas delivery equipment with dual linear dilution zones for chemical delivery. This system can provide high-precision, low-level concentration control of several gas mixtures to enable precise process control. With this advanced unit, users can easily adjust concentration levels for various process chemistries to maximize process yields and ensure consistency across production lots. APPLIED MATERIALS CENTURA DPS+ II has a tightly-controlled thermal environment with heating/coolingbaths that enable optimal temperature control and uniformity for process chemistries. Its temperature control machine is designed to manage the instantaneous temperature change rates of up to 30°C/sec without affecting process stability or time control. In addition, this tool also offers an advanced water-cooled evacuable chamber for minimum stress (temperature/pressure) on the wafer. Centura DPS II has furthermore a powerful, integrated substrate heating asset that is designed with a closed-loop control model for precise and stable temperature control. Its heating equipment operates with temperatures up to 900°C with a temperature stability rating of ±1°C. This advanced heating system ensures uniform wafer temperature across the entire wafer surface for consistent process results. AMAT CENTURA DPS+ II has also a four-zone bubbler unit for cooling and tempering process chemistries. This machine enables easy and stable temperature control for a wide range of process chemistries by providing precise temperature control of the entire bubbler chamber. Finally, APPLIED MATERIALS Centura DPS II comes with embedded advanced diagnostic and process optimization tools. This tool provides real-time monitoring of process data and inspection to ensure that the diffusion process is maintained at optimal levels. Additionally, it also offers process optimization parameters that allow users to get the best possible performance from their process.