Used AMAT / APPLIED MATERIALS Centura DPS II #9253347 for sale

AMAT/AMAT / APPLIED MATERIALS Centura DPS II is an advanced plasma etch reactor designed to deliver superior process performance and improved device yield. The equipment is used in the fabrication of the most advanced semiconductor devices produced today. With its integrated process architecture, AMAT Centura DPS II provides a fully automated and reliable system for etching advanced silicon and compound semiconductor materials. The unit's powerful photochemical vapor deposition (P-CVD) chamber ensures precise deposition of many materials, such as silicon oxide, nitride, polysilicon, metals, and alloys, in complex patterns. APPLIED MATERIALS CENTURA DPS+ II plasma etch chamber offers superior etch rate control and repeatability, enabling process recipes to be more accurately set and repeatably run without manual operator intervention. AMAT CENTURA DPS+ II includes advanced tools such as a multi-tool controller, which allows operators to easily monitor and control up to four etch and deposition processes, while independent hardware and software control systems provide greater flexibility and machine-level flexibility to meet users' specific requirements. The tool's advanced gas delivery asset provides precise gas delivery and tilt control, while advanced internal sources of plasma oxidation and deposition are integrated for higher productivity and process uniformity. Further, the DPS II has advanced fault tolerant software that offers predictive maintenance and model-level diagnostics. In addition to providing excellent plasma etch and deposition, APPLIED MATERIALS Centura DPS II also offers powerful process diagnostics, including real-time optical emissions measurement, laser-induced fluorescence (LIF), as well as automatic decoherence (ADC) measurements. Further, the equipment is equipped with a comprehensive set of process recipes that can be modified to meet the specific needs of users. APPLIED MATERIALS/Centura DPS II is a reliable and versatile production reactor that can handle a broad range of etch and deposition requirements. This cutting-edge system is the ideal choice for users looking to produce the highest quality devices in the most cost-effective manner.