Used AMAT / APPLIED MATERIALS Centura DPS II #9257444 for sale

AMAT / APPLIED MATERIALS Centura DPS II is a powerful extreme high-density plasma source (EHDP) reactor designed to perform atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), and low-pressure chemical vapor deposition (LPCVD) processes. The reactor is primarily used in the production of thin-film semiconductor devices, such as integrated circuits and transistors, made up of dielectric and conductive materials. The reactor features two plasma generation systems - an inductively coupled plasma (ICP) source and a magnet-confined dc glow discharge (DCGD) source. The ICP source is used for sputtering (etching) of materials, and the DCGD source is used for ICP-enhanced deposition of thin films on wafers. The reactor's modular design allows for easy replacement of components and flexibility in the selection of processing parameters. AMAT Centura DPS II offers high-efficiency, high-throughput, low-cost processing for high-volume production runs. It features advanced automatic sampling capabilities, which can provide detailed characterization of samples and enable process optimization. Additionally, it features a high-power drive system that can achieve repeatable and precise film growth rates. The reactor also features a multi-chamber design with a main chamber, a pumping chamber, and a pre-chamber for easier maintenance and operation. Each chamber is equipped with its own cook-off system that minimizes out-gassing and ensures high precision control of temperatures and pressures. The reactor also features an automated wafer loading and unloading system that eliminates manual handling of wafers and reduces the chance of contamination or damage. The reactor is housed in a Class 10 cleanroom, providing a low-contamination environment for optimal film growth or deposition. The housing is also designed to reduce energy consumption and maximize energy efficiency, allowing for cost savings over the long term. In summary, APPLIED MATERIALS CENTURA DPS+ II is a powerful EHDP source reactor designed to enable the production of high-volume, high-precision semiconductor devices. Its modular design provides flexibility in process selection, and its advanced features, such as automatic sampling and wafer loading/unloading, make it suited for production of even the most advanced semiconductor devices.