Used AMAT / APPLIED MATERIALS Centura DPS II #9377212 for sale

AMAT / APPLIED MATERIALS Centura DPS II is an advanced, process-capable reactor designed to meet the needs of many applications within semiconductor, strain engineering, nanotechnology, optical and energy processing. The reactor is capable of operating from low to high temperatures and pressures, and in a variety of complex atmospheres with numerous materials and chemistries. The combination of multi-mode processing and advanced automation allows the reactor to carry out complex processing tasks with precision and repeatability. The reactor has a control equipment that allows for precise control of process parameters, allowing for a wide range of process customization and optimization. The control system has features such as automatic wafer placement to ensure proper wafer positioning, and the ability to set up to four specific deposition recipes that can be stored and recalled for repeatable deposition applications. The operation of the reactor is monitored in real-time with hardware monitoring of the unit hardware, temperature, and other important parameters. The reactor chamber is temperature controlled and can support a wide variety of loading hardware, including bulk wafer, substrate and cassette loading. The chamber design enables rapid cycle times and uniform temperature distribution to create uniform processing results. The two-stage direct heating and indirect cooling reduces contamination and improves process reproducibility. The chamber also features a designed-in safety machine that shuts down operations if the chamber loses pressure or the pressure is too low. AMAT Centura DPS II also has optional additional hardware available, such as an opacity monitor to monitor film thickness, or a form ozone generator generate ozone for chemical reactions. The reactor also has an optional port to allow for inert gas introduction during the deposition process. The reactor is designed to operate in high-vacuum while allowing for variability in process parameters and flexibility in application recipes, thus allowing for optimal conditions for processing. APPLIED MATERIALS CENTURA DPS+ II is capable of precise and repeatable processing in a wide range of temperatures and gases. It guarantees high-quality results that will exceed the standards of semiconductor, strain engineering, nanotechnology, optical and energy processing applications. This reactor is designed for ease of use and reliability with advanced automation and control capabilities to provide uniform and efficient results with minimal maintenance and upkeep.