Used AMAT / APPLIED MATERIALS Centura DPS II #9390589 for sale

AMAT / APPLIED MATERIALS Centura DPS II is a high Vacuum, dual single-wafer-handling reactor designed for semiconductor processing applications. It offers users a complete range of tools for critical etch and deposition processes. Utilizing innovative technology, it is capable of achieving precise and consistent end-results. The DPS II is equipped with a closed-chamber equipment that works in combination with a "toroid" plasma source to achieve uniform high temperature plasma processing and maximum process uniformity. This closed-chamber system also minimizes reactive gas utilization, which increases unit throughput. It is constructed with 3 independent keys to enable manual operation and provide higher levels of safety when operating the machine. The DPS II is designed to repair advanced microelectronic devices. It features users-friendly, programmable controls with dedicated windows and touch-driven menu screens. A simple selection process allows for easy batch selection of wafers, and automatic validation of parameters prior to each run. This reactor also includes a PECVD capability that allows for further process extension. The tool's design offers high compatibility. It's compatible with a wide variety of materials, such as Silicon oxide, Silicon nitride, Low-k dielectrics, spin-on-dielectric, polysilicon, Silicon Carbide, and Silicon Germanium. Its ultra-low pressure technology ensures excellent tissue engineering for reliable and efficient processes. The patented Close-Proximity power asset creates a high-effective plasma sheath around the wafer that allows for higher ion energy during etching and deposition. This results in better cleaning and etch selectivity. Its thermal control model enables precise control of chamber temperature in a very short time. The equipment's advanced material delivery system provides reliable and consistent materials delivery. The DPS II is capable of running up to 3UF spectrometers simultaneously, so users can measure, monitor and control deposition rates, uniformity, and composition in real time. It includes advanced wafer handling features, like enhanced endpoint detection for process tuning. Its high-efficiency load locks also provide higher throughput. The unit is also easy to maintain, features user maintenance parts, and user top-down cleaning. The top and bottom heat plates provide fast, reliable heating for processes that don't benefit from a hot temperature. Its advanced security configuration makes it difficult to access sensitive data. In conclusion, AMAT Centura DPS II is a single-wafer, high-vacuum reactor designed to efficiently process high-performance microelectronic devices. It features various innovative technologies, programmable controls, high compatibility with various materials, and advanced security features. This reactor is also easy to maintain and offers high throughput for efficient production.