Used AMAT / APPLIED MATERIALS Centura DPS Poly #9293858 for sale

AMAT / APPLIED MATERIALS Centura DPS Poly Reactor is a high-performance, automated chemical vapor deposition (CVD) equipment that is an ideal tool for a variety of research and industrial applications. The reactor features a modular design that allows for a wide variety of substrates and process conditions to be used. AMAT Centura DPS Poly Reactor has the ability to deposit metal, polysilicon, and oxide films, as well as multi-layer films with precise control of thickness, uniformity, and composition. The reactor's advanced process chamber has a simple, ergonomic design that enables it to achieve extremely high vacuum levels quickly and accurately. It features a heavy-duty quartz cold wall for protection against high temperature exposure, and the walls are coated with a special anti-corrosion material for maximum longevity. The reactor also includes an automated wafer transfer module for easy loading and unloading of multiple wafer sizes. APPLIED MATERIALS CENTURA DPS+ POLY Reactor has a state-of-the-art control system that allows for precise and repeatable control over process parameters including temperature, pressure, deposition rate, dopant concentration, and more. The unit is designed for flexibility so that its process recipes can be easily adjusted to accommodate different film types and layers. The reactor also has a powerful vacuum machine that can achieve pressures as low as 1E-7 Torr. In addition, the reactor is highly customizable with advanced features such as vertical and lateral wafer susceptibility, color touch-screen display, and an intuitive software interface. It also comes with a comprehensive library of built-in recipes, which have been optimized for process repeatability and uniformity. APPLIED MATERIALS Centura DPS Poly Reactor is the ideal tool for a variety of research and industrial applications, due to its wide range of features, precise control, and long service life. It is an invaluable asset to any laboratory or production facility that needs to deposit films with both speed and accuracy.