Used AMAT / APPLIED MATERIALS Centura DPS R1 #9188285 for sale

AMAT / APPLIED MATERIALS Centura DPS R1 is a chemical vapor deposition (CVD) reactor designed for the deposition of ultra-thin, homogeneous films on integrated circuits and devices. The equipment is particularly suited for deposition applications where precision and high-quality films are required. It features multiple independent high-vacuum chambers and a dual-frequency RF power supply for optimal process control and uniformity over a large area. The main chamber of the system contains two RF sources, one acting as a high frequency source and the other as a low frequency source. The low frequency source provides high-energy pulses to enable the deposition of thicker layers for circuit protection or to reduce the damage caused by high power laser writing. Both sources can be used simultaneously to achieve uniform deposition over the entire reaction area. The chamber is connected to a quartz susceptor that is capable of supporting wafers up to 12 inches in diameter. The unit is equipped with an advanced gas-control machine with automated temperature and pressure control. This enables the user to precisely control the deposition process, ensuring optimal vaporization and deposition of the material. The tool is also equipped with a computer-controlled optimizing chamber for uniformity of the deposition over the entire work area. The chamber can be fitted with a range of sample holder sizes, ideal for different applications. AMAT Centura DPS R1 is designed for a wide range of CVD films, including silicon, tungsten, titanium, silicide, and aluminum. It has also been used to deposit nitride and oxide layers, and the ability to use different gas-injection systems ensures optimal film characteristics. The asset is suitable for high-speed production lines as well as lab research applications. The model can be quickly programmed for a wide range of configurations. In addition, it has various safety features and is designed to ensure operator safety, making it ideal for production environments. The equipment also features process monitoring and tuning mechanisms to ensure maximum efficiency and reliability.