Used AMAT / APPLIED MATERIALS Centura DPS R1 #9188286 for sale

AMAT / APPLIED MATERIALS Centura DPS R1 is a versatile and compact single-wafer vacuum deposition equipment. With its quick-access design, it can be configured as an ideal system for numerous deposition processes. It provides wafer transfer within the same cluster, without the need for substrate shuttling between coats. The deposition processes enabled by the unit are single and sequential PVD, ALD, sputter, oxidize, and amorphous silicon based processes. The DPS R1 machine is designed for economy of motion, software driven motion control, providing uptime and maximizing throughput. It is loaded with full cycle process diagnostics and automation that monitors all components in a deposition, resulting in repeatable and reliable processes which help improve yields. AMAT Centura DPS R1 is designed for dielectric, metal, and passivation films, as well as films deposited or etched at reduced or increased pressure. This helps control substrate stress and etch selectivity. The tool is fully integrated and includes a quartz bell jar, vacuum asset, loadlock, and wafer transfer automation. The integrated software is an intuitive graphical user interface powered by AMAT Genesis software. This software provides an unparalleled look into real time data and utilizing the intelligent diagnostics to streamline the debugging process. It also provides easy to interpret interface data and can handle repetitive tasks quickly. Additionally, the intuitive Graphical User Interface (GUI) offers a guided approach and optimizes the deposition process. APPLIED MATERIALS Centura DPS R1 is mated to smart tower technology, helping to reduce maintenance downtime and cost. With up to three process modules integrated in a single model, it reduces tool configuration time and capital expenditure. The power efficient design also helps to deliver an improved ROI. In summary, Centura DPS R1 is an economical, high performance single-wafer vacuum deposition equipment, offering quick delivery of consistently repeatable processes with an easy to use graphical user interface for real time data processing. With its simplified design and powerful features, it is well suited for deposition processes in the semiconductor industry.