Used AMAT / APPLIED MATERIALS Centura DPS R1 #9188288 for sale

AMAT / APPLIED MATERIALS Centura DPS R1 is a high quality production reactor designed for semiconductor applications. This equipment is used to etch and deposit various materials in a vacuum environment. The high temperature capabilities of this reactor aids in improving the quality of the results. The reactor is equipped with several pieces of technology which make it superior to older models. These include numerous plasma sources, an automated atmospheric pressure reaction chamber with integrated shower heads, and an ion bombarder. With these features, AMAT Centura DPS R1 is able to deposit layers of materials on wafers with high step coverage and uniformity. The reaction chamber of the reactor can reach temperatures of up to 1000 degrees Celsius. This allows the production of metals and other materials with high reflow and excellent adhesion characteristics. The plasma sources are carefully tuned to produce the necessary power levels to optimize the deposition rate and layer uniformity. The ion bombardment has been designed to further improve material quality and process repeatability by ensuring precise control of the conditions within the reaction space. In addition to the unique features, the reactor is also equipped with safety features which protect both equipment and personnel. These include a programmable pressure limit, automated door locks, and an integrated power shutoff. The design incorporates a system of N2 scrubbers and vacuum pumps which ensure that all volatile particles and material debris are safely contained and removed from the workspace. APPLIED MATERIALS Centura DPS R1 reactor provides an excellent platform for the production of high quality materials at a fraction of the time and cost through automated processes. The use of Centura DPS R1 system is highly recommended as it offers a reliable, cost-effective, and safe solution for semiconductor-based etch and deposition processes.