Used AMAT / APPLIED MATERIALS Centura DPS R1 #9188290 for sale

AMAT / APPLIED MATERIALS Centura DPS R1 is a next-generation semiconductor production reactor designed for device development and manufacturing. The DPS R1 is an advanced, high-throughput reactor designed to perform both deposition and etch processes in one integrated equipment. The reactor combines highly effective and reliable process control with a broad range of reliable process modules to enable maximum process flexibility. AMAT Centura DPS R1 is ideal for advanced development process optimization, device development and manufacturing. The system utilizes integrated Process Module Pods (PMPs) to allow a variety of processing options and flexibility. Utilizing the PMPs, the reactor can perform both deposition and etch processes in one integrated unit. The reactor is also capable of running a wide range of deposition and etch applications, including a wide range of materials (Si, Ge, SiGe, GaAs, III-V, Nitrides, Poly-Si and Silicon-Nitride). APPLIED MATERIALS Centura DPS R1 is designed to deliver high-speed performance in the shortest possible cycle time while enabling the highest levels of uniformity and conformality. The reactor also utilizes a patented wafer-to-chillplate temperature-control feature that provides fast, uniform heating/cooling of the wafers. This unique feature ensures a fast, consistent reaction time and prevents non-uniformity in both the deposition and etching processes. Centura DPS R1 is capable of utilizing a wide range of source gases, including H2, Ar, Cl2, NF3, O2, and XeF2. This flexibility allows the reactor to perform various deposition and etching processes for both frontside and backside processes in various material systems. In addition, the machine offers flexibility in tool configurations, including single- or dual-source wafer processing and single field-of-view or large area-of-view imaging systems. AMAT / APPLIED MATERIALS Centura DPS R1 is the perfect asset for advanced device development and semiconductor production facilities. It is highly reliable, fast and flexible while delivering excellent results. The reactor uses highly advanced process control and efficient process modules combined to provide a highly stable, optimized process. The model provides additional OPC and EBR options to fine-tune your process parameters and ensure optimum equipment performance.