Used AMAT / APPLIED MATERIALS Centura DPS R1 #9188605 for sale

AMAT / APPLIED MATERIALS Centura DPS R1 reactor is an advanced deposition equipment designed and developed for the semiconductor industry. AMAT Centura DPS R1 reactor is capable of producing ultrathin layers of compounds and nitrides for microelectronic applications. Its advanced system components help maximize efficiency and process reliability while minimizing the process costs. APPLIED MATERIALS Centura DPS R1 reactor is made up of several components such as the substrate heating module, a platform, and multiple quartz tubes with quartz covers. The combination of components enables the unit to provide a balanced environment in order to accommodate a wide range of materials deposition processes. The platform allows the tools to be arranged into a linear or radial design depending on the process configuration. The substrate heating module helps to ensure a uniform temperature across the surface of the substrate while minimizing the differences between the substrate and the quartz tubes. The quartz tubes are equipped with digital pressure controllers and RF power supplies in order to provide uniform, precise, and reliable deposition thickness. Centura DPS R1 reactor is designed to provide quick, accurate, and consistent temperature control. Further, the machine features an advanced thermocouple detection tool that gives enhanced protection against thermal shock. This asset employs a multi-zone temperature sensor for precise control, an active clamping mechanism with built-in damping, and a rapid cycle enablement model. The temperature detection also ensures uniform deposition rate over large areas and enables faster temperature ramp-up and cooldown rates. The equipment is equipped with a highly reliable vacuum and filtration system that allows it to produce a perfectly clean and dust free environment in order to prevent any particle contamination. This is made possible through multi-stage filtration, active flushing, and cryo-pumping. The unit also features a high reliability low flow mass flow controllers (MFC's) to facilitate precise gas delivery from a compliant source with minimal dispersion. AMAT / APPLIED MATERIALS Centura DPS R1 reactor is ideal for a wide range of applications such as coating, nitriding, oxide deposition, diffusions, CVD processes, and electroless plating. The machine is highly flexible and can be used for manufacturing ULK, Metalization layers, etch-stop layers, inter-metal dielectrics, and other similar applications. AMAT Centura DPS R1 can also provide innovative and optimized process recipes using advanced kinetic-process control capabilities.