Used AMAT / APPLIED MATERIALS Centura DPS #198321 for sale

AMAT / APPLIED MATERIALS Centura DPS tool is a production scale and research-proven chemical vapor deposition (CVD) reactor. The reactor provides an advanced plasma-enhanced deposition platform for a broad range of materials and applications at production-ready fab levels of productivity. AMAT Centura DPS equipment offers unrivaled deposition capabilities, with a low-pressure, innovative deposition chamber and plasma generator. The deposition chamber pressure can be adjusted for optimum process selectivity, and the pulsed-modulated, programmable-waveform generator can precisely tune the unique plasma source. As an added benefit, the system has the capability to support reactive and non-reactive processes, including chemical, atomic layer, and physical vapor depositions. APPLIED MATERIALS Centura DPS unit features an advanced, multi-zone reactor design with multiple planes of addressability. This provides a uniform process across the entire substrate surface, as well as unprecedented feature reproducibility. The versatility of the reactors allow for deposition of dielectrics, semiconductors, and metals on a wide range of substrate sizes. Using the Advanced Load-Locker Technology and True In-Situ Process Control, Centura DPS machine ensures accurate deposition of all materials with high reproducibility. The intuitive graphical user interface allows operator control of the whole process from deposition parameters to gas flow rate and pressure. This allows for accurate and repeatable results. The advanced process performance of AMAT / APPLIED MATERIALS Centura DPS tool is also optimized for higher throughputs. This advanced asset also supports Remote Model Control and Advanced Data Analysis, providing flexibility and higher levels of efficiency for today's modern production environment. The benefits of AMAT Centura DPS equipment are numerous. The versatility, simplicity and throughput of the system will provide consistently reproducible results and a higher degree of process accuracy. Additionally, this unit provides ultra-high vacuum levels, enabling optimal control and reproducibility of the process. This allows for cost savings while enabling maximum yields and flexibility.