Used AMAT / APPLIED MATERIALS Centura DPS+ #293608987 for sale

AMAT / APPLIED MATERIALS Centura DPS+
ID: 293608987
Wafer Size: 8"
Vintage: 2012
Etchers, 8" Centura-II, 6" (3) Poly chambers Controller rack Missing parts: MF AC Racks Generator Controller 2012 vintage.
AMAT / APPLIED MATERIALS Centura DPS+ is a single-wafer chemical vapor deposition (CVD) reactor designed to perform thin-film deposition processes for the high-volume production of advanced devices such as MEMS and other microscale and nanoscale materials. It is composed of four main components: a processing chamber, a gas delivery equipment, a vacuum system, and a control unit. The processing chamber is the central component of AMAT Centura DPS+, and is made from stainless steel, aluminum alloys, and ceramic components. It includes a gas inlet, an exhaust port, a wafer stage, and several quartz viewing ports for process monitoring. The wafer stage is designed to support the wafer during processing and features positioners with nitrogen-purged systems to reduce contamination. The gas delivery machine provides the necessary reactive gases to the processing chamber and is composed of manifold blocks, pressure filters, mass flow controllers, and a temperature-controlled tool. The vacuum asset is responsible for evacuating the processing chamber and consists of a roughing pump and a rotary vane mechanical pump. The control model enables precise control of all the process parameters, including temperature, gas flow rates, reactor pressure, and wafer temperature. It also includes a data logging equipment for monitoring and recording process data over time. The system is fully automated, allowing for rapid setup, product implementation, and process monitoring. In sum, APPLIED MATERIALS CENTURA DPS+ is a reliable and robust single-wafer CVD tool designed to enable the production of advanced devices with consistent high-quality results. The unit enables precise control of the essential process parameters, and its closed-loop control machine ensures a high level of process stability and repeatability.
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