Used AMAT / APPLIED MATERIALS Centura DPS+ #9188292 for sale

AMAT / APPLIED MATERIALS Centura DPS+ is a high-performance chemical vapor deposition (CVD) reactor designed to support the deposition of advanced materials with a high degree of process control. With an industry-leading chamber design, AMAT Centura DPS+ reactor can deposit materials with higher quality and reliability than other CVD systems. It is designed for high-volume production of materials such as graphene, carbon nanotubes, and various oxide materials, as well as the deposition of dielectrics, metals, and other compounds for advanced semiconductor applications. APPLIED MATERIALS CENTURA DPS+ has a hermetically sealed chamber with a unique, ultra-high pumping speed design. This combination of pressure, temperature, and kinetic-energy control provides a low-temperature gas phase deposition platform that supports highly conformal, uniform, and high-quality material growth over large areas. The chamber is isolated from the vacuum pump, thus eliminating a major source of contamination. It is also capable of delivering higher throughput than competing systems given its larger substrate size, up to 200mm in diameter. The reaction chamber is equipped with options to deposit materials using two types of deposition sources: first, wafer-showerhead, which is a tilted showerhead source oriented perpendicular to the substrate, and the second, a traditional vertical showerhead source. In addition, AMAT / APPLIED MATERIALS CENTURA DPS+ can be modified to accommodate precursor delivery systems such as bubblers, molecular beam epitaxy sources, and gas boxes. CENTURA DPS+ has an intuitive control equipment which allows users to program multiple recipes with a few clicks and quickly implement complex deposition processes. Users can also monitor individual process steps or run analytics such as rate of reaction or precursor utilization. The system's robust automation interface integrates easily into automated processing lines and its open architecture allows for custom programmability and tuning. In short, AMAT CENTURA DPS+ reactor is an extremely versatile, high-volume CVD unit that can be used for depositing a wide range of materials with superior quality and reliability. Its hermetic chamber design and versatile deposition source configurations provide users with unprecedented process control and material uniformity over large areas. Its intuitive control machine and automation integration capabilities make it an ideal solution for demanding processing needs.