Used AMAT / APPLIED MATERIALS Centura DPS+ #9233290 for sale
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ID: 9233290
Wafer Size: 8"
Vintage: 2001
Poly etcher, 8"
Mainframe: Centura 2
Chamber A, B & C:
DTCU: ES-DTCU
Gate & throttle valve: TGV, VAT
EDWARDS STP-A2203 Turbo pump
Pumping tube: Heated
ADVANCED ENERGY Altas 2012 Generator (Source)
ENI ACG-6B Generator (Bias)
ESC: Ceramic
EPD: Normal
Chamber E: Fast cool down
Chamber F: Orieter
Xfer: VHP
L/L: Narrow, heated, tilt-out
Hoist: Local hoist
Gas panel:
Chamber A, B&C:
Gas / Size / Model
Cl2 / 200sccm / 8161
HBr / 200sccm / 8160
Cl2 / 50sccm / 8160
NF3 / 100sccm / 8161
N2 / 20sccm / 8161
CF4 / 50sccm / 8161
SF6 / 50sccm / 8161
O2 / 100sccm / 8161
He / 20sccm / 8161
Ar / 200sccm / 8160
Missing parts:
Process chamber chiller & hose
EPD PC & Monitor
Chamber D (ASP+):
Microwave generator missing
Tuner missing
Magnetron head
Dummy load
Wave guide gas panel parts
VDS
2001 vintage.
AMAT / APPLIED MATERIALS Centura DPS+ is a plasma-enhanced chemical vapor deposition (PECVD) reactor designed for deposition processes. It is well-suited for a variety of applications, from advanced thermocompression bonds to advanced metallization layers to the growth of nonpolar dielectrics and oxides. The DPS+ is ideal for the complete range of deposition operations - regardless of the complexity or demands of the required film composition. AMAT Centura DPS+ has a two-gun, two-shutter hardware configuration with full 7-axis motion control, allowing it to adjust the position of the substrate and the deposition source with precision accuracy. The full motion control provides process flexibility, enabling high-precision processes with advanced control sequences. Furthermore, the ability to easily access the substrate holder allows for quick loading and unloading of substrates. For added convenience, the DPS+ has several in-situ or near-situ monitor processes, which monitor the process conditions, providing real-time feedback and allowing process optimization through on-the-fly adjustments. This real-time monitoring also enables a high level of situational awareness and ensures that all processes are running smoothly and efficiently. The reactor also features a unique computer controlled gas distribution equipment consisting of an internal carrier gas supply, a gas flow controller, and an embedded gas mixture control system. This unit allows for precise control of the process conditions and ensures an optimized gas delivery for each individual process. In terms of safety, APPLIED MATERIALS CENTURA DPS+ employs a variety of measures to ensure safe operation, from a robust electrical machine to a programmable interlock tool, to an independently certified emergency stop asset. Furthermore, the reactor has stringent alarm systems that monitor all processes, alerting operators of any process irregularities. AMAT CENTURA DPS+ is a versatile and reliable reactor that can handle a wide range of application requirements. Its full motion control, advanced monitoring capabilities and independent safety systems give it an advantage over other reactors on the market. The control systems help ensure precise control of the process conditions and give users greater control over the deposition process, making it a valuable tool for quality control and assurance.
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