Used AMAT / APPLIED MATERIALS Centura DPS+ #9233290 for sale

ID: 9233290
Wafer Size: 8"
Vintage: 2001
Poly etcher, 8" Mainframe: Centura 2 Chamber A, B & C: DTCU: ES-DTCU Gate & throttle valve: TGV, VAT EDWARDS STP-A2203 Turbo pump Pumping tube: Heated ADVANCED ENERGY Altas 2012 Generator (Source) ENI ACG-6B Generator (Bias) ESC: Ceramic EPD: Normal Chamber E: Fast cool down Chamber F: Orieter Xfer: VHP L/L: Narrow, heated, tilt-out Hoist: Local hoist Gas panel: Chamber A, B&C: Gas / Size / Model Cl2 / 200sccm / 8161 HBr / 200sccm / 8160 Cl2 / 50sccm / 8160 NF3 / 100sccm / 8161 N2 / 20sccm / 8161 CF4 / 50sccm / 8161 SF6 / 50sccm / 8161 O2 / 100sccm / 8161 He / 20sccm / 8161 Ar / 200sccm / 8160 Missing parts: Process chamber chiller & hose EPD PC & Monitor Chamber D (ASP+): Microwave generator missing Tuner missing Magnetron head Dummy load Wave guide gas panel parts VDS 2001 vintage.
AMAT / APPLIED MATERIALS Centura DPS+ is a plasma-enhanced chemical vapor deposition (PECVD) reactor designed for deposition processes. It is well-suited for a variety of applications, from advanced thermocompression bonds to advanced metallization layers to the growth of nonpolar dielectrics and oxides. The DPS+ is ideal for the complete range of deposition operations - regardless of the complexity or demands of the required film composition. AMAT Centura DPS+ has a two-gun, two-shutter hardware configuration with full 7-axis motion control, allowing it to adjust the position of the substrate and the deposition source with precision accuracy. The full motion control provides process flexibility, enabling high-precision processes with advanced control sequences. Furthermore, the ability to easily access the substrate holder allows for quick loading and unloading of substrates. For added convenience, the DPS+ has several in-situ or near-situ monitor processes, which monitor the process conditions, providing real-time feedback and allowing process optimization through on-the-fly adjustments. This real-time monitoring also enables a high level of situational awareness and ensures that all processes are running smoothly and efficiently. The reactor also features a unique computer controlled gas distribution equipment consisting of an internal carrier gas supply, a gas flow controller, and an embedded gas mixture control system. This unit allows for precise control of the process conditions and ensures an optimized gas delivery for each individual process. In terms of safety, APPLIED MATERIALS CENTURA DPS+ employs a variety of measures to ensure safe operation, from a robust electrical machine to a programmable interlock tool, to an independently certified emergency stop asset. Furthermore, the reactor has stringent alarm systems that monitor all processes, alerting operators of any process irregularities. AMAT CENTURA DPS+ is a versatile and reliable reactor that can handle a wide range of application requirements. Its full motion control, advanced monitoring capabilities and independent safety systems give it an advantage over other reactors on the market. The control systems help ensure precise control of the process conditions and give users greater control over the deposition process, making it a valuable tool for quality control and assurance.
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