Used AMAT / APPLIED MATERIALS Centura DPS+ #9233293 for sale

ID: 9233293
Wafer Size: 8"
Vintage: 1999
Poly etcher, 8" Mainframe: Centura Phase2 Chamber A, B & C: DTCU: ES-DTCU Gate & throttle valve: TGV, VAT EDWARDS STP-A2203 Turbo pump Pumping tube: Heated ADVANCED ENERGY Altas 2012 Generator (Source) ENI ACG-6B Generator (Bias) ESC: Ceramic EPD: IEP Chamber F: Orieter Xfer: HP Robot L/L: Narrow, heated, tilt-out Hoist: Local hoist Gas panel: Chamber A & C: Gas / Size / Model HBr / 200sccm / 8160 Cl2 / 200sccm / 8160 Cl2 / 50sccm / 8160 SF6 / 50sccm / 8160 N2 / 20sccm / 8160 Ar / 200sccm / 8160 CF4 / 100sccm / 8161 He / 20sccm / 8160 O2 / 100sccm / 8161C Chamber B: Gas / Size / Model HBr / 200sccm / 8160 Cl2 / 200sccm / 8161C Cl2 / 50sccm / 8160 SF6 / 50sccm / 8160 N2 / 20sccm / 8160 Ar / 200sccm / 8160 CF4 / 100sccm / 8161C He / 20sccm / 8160 O2 / 100sccm / 8161C Missing parts: Process chamber chiller & hose 1999 vintage.
AMAT / APPLIED MATERIALS Centura DPS+ is a state-of-the-art reactor used to perform various semiconductor fabrication processes. It is a dielectric deposition product suite that provides fast and accurate deposition of dielectric films for a wide range of semiconductor device applications. The equipment is capable of producing passivated layers on a variety of substrates such as silicon, quartz, glass, polyimide and other surfaces. AMAT Centura DPS+ has a maximum field size of 25 square inches, with a minimum dose capability of 1-microamp. Its reactors feature a four-quadrant rotary sputter configuration that ensures uniform processing of all substrates. The system is also equipped with a high-speed sputtering source capable of achieving adoption rates of up to 1nm/s. This helps to give the unit high throughput capabilities. The machine also has an advanced thermal control for achieving precise temperature control for deposition processes, resulting in a more uniform and consistent result. APPLIED MATERIALS CENTURA DPS+ also features a suite of chemical-based cleaning and pre-clean capabilities, allowing for efficient wafer processing. It also comes with a touch-screen monitor that allows for real-time monitoring of various parameters during the processing cycle. The tool is compliant with various protocol standards such as UNI-Core, SEMI and GCR. It also has an ISO-9002 certification and operates at a Class II cleanroom grade, ensuring consistent and reliable results inevery processing cycle. The Centura is constructed with a sturdy, highly corrosion-resistant stainless-steel frame, which ensures a long lifetime of reliable operation in the harshest of environment. Overall, CENTURA DPS+ is a robust and reliable reactor, designed to provide high throughput and precise control over a variety of semiconductor fabrication processes. It is suitable for both research and industrial applications, offering precise temperature and chemical control over the process. With its impressive specifications, the Centura is one of the best tools for creating high-quality and reliable devices.
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