Used AMAT / APPLIED MATERIALS Centura DPS+ #9233299 for sale

AMAT (APPLIED MATERIALS/APPLIED) MATERIALS AMAT / APPLIED MATERIALS Centura DPS+ reactor is an industry-leading, medium-sized PECVD (Plasma-Enhanced Chemical Vapor Deposition) reactor used for diffusion and deposition of thin films. It is a scaleable and self-contained tool used for the deposition of semiconductor films, metals, films, and other materials. AMAT Centura DPS+ is unique in its ability to provide a range of user-friendly active-gas and wafer-loading configurations. The active-gas module allows for a larger set of gases to be selected and used at a given pressure, enabling a more efficient and controlled deposition process. Additionally, manual/automatic loading options make it possible to switch between different wafer sizes, as needed. This combination of features enables users to quickly adjust and tailor their process to specific design requirements. APPLIED MATERIALS CENTURA DPS+ reactor also features a powerful hybrid-cluster source for generating plasma. This source is capable of producing high-density, monotonically polarized plasma meeting the tight temperature, pressure and RF power requirements of PECVD processes. This hybrid-cluster source takes advantage of a self-consistent mathematical technique to generate plasma that minimizes the probability of flashover and ensures consistently uniform coverage of the target substrate. APPLIED MATERIALS Centura DPS+ also has a sophisticated diagnostics suite enabling accurate monitoring of all critical process parameters. This suite of diagnostics can be used to confirm that all process parameters are within specifications and that the deposition process is running properly. The diagnostics suite includes RF level, wafer temperature, deposition rate, source power, pressure, and plasma distribution measurements. AMAT / APPLIED MATERIALS CENTURA DPS+ is a versatile and easy-to-use reactor that is capable of providing reliable and repeatable process control. It enables users to select, customize and control the deposition of thin films, metals, and other materials. Its combination of powerful hybrid-cluster sources, user-friendly active-gas and wafer-loading configurations, and sophisticated diagnostics suite make it ideal for providing consistent and reliable process control across multiple batches.