Used AMAT / APPLIED MATERIALS Centura DPS+ #9249569 for sale

ID: 9249569
Poly etcher Load lock: Wide (3) Chambers DPS+ poly Robot: VHP+.
AMAT / APPLIED MATERIALS Centura DPS+ is an advanced plasma etch reactor designed to perform both deep anisotropic etching and shallow isotropic processes with high selectivity and minimal damage to underlying layers. It is equipped with an automated remote control equipment that makes operation fast and efficient. The reactor is based on the proprietary AMATSi (Advanced Materials Atomic Thickness Selection) etch technology and includes a wide selection of process gases to provide optimized results for various applications. Its unique "multi-padding" design creates a uniform pressure along the entire process chamber, which allows for tight process control, improved uniformity and repeatability, and greater yield and cost savings. AMAT Centura DPS+ can be configured for both PECVD (Plasma Enhanced Chemical Vapor Deposition) and PEB (Plasma Enhanced etching) processing. PECVD processing is used to grow thin films of metal and other materials on a substrate such as a PCB or silicon wafer. PEB processing is used to remove these films and etch the underlying materials such as metal and dielectrics. APPLIED MATERIALS CENTURA DPS+ is constructed using a multi-stage approach and can process wafers as large as 8-inches in a single run. The reactor chamber is designed to accommodate custom gas delivery systems and process controllers, enabling users to tailor their process to precisely match the specifications of their application. AMAT CENTURA DPS+ is powered by an advanced twelfth generation power supply, enabling higher plasma density and improved process uniformity in the etching process. The system is also equipped with an advanced vacuum unit for rapid evacuation of process waste and organic species. Additionally, the machine can be used to monitor and analyze the process in real time, allowing users to make any necessary adjustments to the process quickly and easily. CENTURA DPS+ is a powerful and advanced etch reactor tool, delivering superior performance and repeatability. The comprehensive design and advanced features make this a cost-effective solution for etching applications in a range of industries.
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