Used AMAT / APPLIED MATERIALS Centura DPS #9258527 for sale

AMAT / APPLIED MATERIALS Centura DPS
ID: 9258527
Wafer Size: 12"
Vintage: 2006
Etcher, 12" 2006 vintage.
AMAT / APPLIED MATERIALS Centura DPS (Direct Plasma Source) is a versatile, single-wafer reactor that provides a reliable and repeatable plasma environment for critical film deposition processes. The single-wafer design eliminates the need for manual transfers, which facilitates fast and efficient production rates. The reaction chamber is designed to improve process control and increase film uniformity, allowing users to achieve the highest performance across a variety of deposition processes, including single wafer epitaxy and CVD processes, dielectric interlayer deposition, and metallization processes. AMAT Centura DPS offers an array of features and benefits, starting with an advanced, high-efficiency RF generator that provides a stable plasma environment with minimal impurities. The equipment utilizes sophisticated automated control software to enable flexible and efficient operations, enabling users to create and update recipes, and even supports the option of direct recipe transfer between systems. In addition, APPLIED MATERIALS Centura DPS has a built-in gas and liquid delivery system for convenient gas purging and liquid cooling. The unit's design also enables high-density, close-tolerance processing, with narrow process windows and process repeatability over extended periods of time. The machine also includes an integrated filament cleaning station for reduced maintenance and increased uptime. It features a high-pressure shower interface for efficient processing of thick films and utilizes an embedded diagnostic tool for automated fault detection and feedback. Finally, the asset has a number of safety features, such as an emergency shutdown model and emergency vent valve, to ensure safe and reliable operations. In conclusion, Centura DPS is an industry-leading single-wafer reactor built to meet the demanding requirements of advanced fabrication processes. With its built-in RF generator, automated software, high-density design, integrated gas and liquid delivery, embedded fault detection, and safety features, the equipment is designed to provide reliable and repeatable processing with minimal downtime.
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