Used AMAT / APPLIED MATERIALS Centura DPS #9275464 for sale

AMAT / APPLIED MATERIALS Centura DPS is a dual-pocket chemical vapor deposition (CVD) reactor designed to deposit high-quality films on substrates. It utilizes advanced process control to ensure consistent and repeatable results. The equipment uses a dual-pocket design that enables the user to sequentially process two wafers simultaneously and independently, providing much higher throughput than traditional single-pocket systems. The individual processing of the wafers improves processing consistency across both wafers and increases overall uniformity within the same batch of wafers. AMAT Centura DPS employs two independent 75mm hot-wall CVD chambers and a common source material loading/unloading chamber. Each CVD chamber is equipped with two 2kw infrared lamps, a pyrometer, and an integral gas introduction manifold with four gas lines. The independent temperature control of each lamp, provided by a temperature programmer, creates a temperature gradient in each chamber that allows the deposition of films with precise thicknesses and uniformity across the substrate. APPLIED MATERIALS Centura DPS also features a turbo dioxide generator that provides a single source of ultra-pure anhydrous hydrogen and nitrogen gases to create a high quality deposition environment. Centura DPS is designed to provide reliable, repeatable deposit results, with an enhanced capability to deposit films composed of a variety of materials from aluminum to tungsten. By combining multiple film layers and treatments, AMAT / APPLIED MATERIALS Centura DPS can realize new materials, coatings, and physical properties for a variety of substrates. The system is capable of producing uniform oxide and nitride films to the atomic level, allowing for precise control of the chemical and physical structure of the substrate. In addition to providing deposition control, AMAT Centura DPS is also designed to improve user safety. The unit's built-in edge detection feature coupled with its latching manifold containment apparatus eliminates any risk of exposure to toxic gases. Furthermore, the dual-pocket design significantly reduces the overall temperature of the reactors, resulting in a cooler environment and further reducing the risk of accidents or exposure. APPLIED MATERIALS Centura DPS is a revolutionary CVD machine designed to produce high-quality films on substrates with precise control and increased safety. Combined with its dual pocket capabilities, Centura DPS provides a high throughput solution to a wide range of advanced material applications.