Used AMAT / APPLIED MATERIALS Centura DPS #9301836 for sale
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ID: 9301836
Wafer Size: 12"
Vintage: 2005
Etcher, 12"
(3) FI Port
FI Robot: TBC
PC: TBC
Thickness metrology: NANOMETRICS 9010 Integrated metrology (1000-00829)
Mainframe: Centura AP
Xfer robot: VHP Ceramic blade
Chamber A: DPS Tsubasa
Chamber B: DPS Advance edge
EDWARDS Turbo pump
Controller: SCV-1500
Gate valve: VAT
RF Generator: ADVANCED ENERGY Apex 1513 and Apex 3013
Gases:
MFC No / Make / Gases / SCCM
31 / CELERITY / SiCl4 / 100
32 / CELERITY / Cl2 / 100
33 / CELERITY / CH2F2 / 100
34 / CELERITY / BCl3 / 400
35 / CELERITY / NF3 / 100
36 / CELERITY / H2 / 200
37 / CELERITY / HBr / 500
38 / CELERITY / C4F8 / 100
39 / HORIBA / O2 / 200
40 / CELERITY / Ar / 200
41 / CELERITY / N2 / 50
42 / CELERITY / CF4 / 200
43 / CELERITY / CHF3 / 200
44 / CELERITY / H2 / 200
Chamber D: Axiom
MFC No / Make / Gases / SCCM
37 / CELERITY / O2 / 10000
38 / CELERITY / 4%H2/N2 / 500
40 / CELERITY / N2 / 10000
Chiller:
Chamber A and B: SMC INR-498-043A
Chamber A: SMC INR-498-016
Chamber B: SMC INR-498-003D
Xfer and L/L pump: TOYOTA T100L
Missing parts:
Hard Disk Drive (HDD)
(3) Dry pumps
2005 vintage.
AMAT/AMAT / APPLIED MATERIALS Centura DPS is a versatile reactor designed for etching and deposition of materials in the semiconductor manufacturing process. AMAT Centura DPS operates as a comprehensive standalone unit, capable of creating cost-effective and reliable processing solutions for multiple process applications. The DPS's dual-chamber design makes it ideal for use on multiple levels, allowing it to simultaneously immerse substrates and perform complex etching operations and material deposition duties. The dual chamber is optimized to support up to 7 process gas lines; while the first chamber is lined with quartz and operates at a temperature of between 75 to 325 degrees Celsius, the second chamber supports up to 16 quartz trays and operates at a temperature of -10 to 600 degrees Celsius. APPLIED MATERIALS Centura DPS has been engineered with a comprehensive range of controls, allowing optimal performance of various process duties. For instance, the chamber is equipped with vacuum, matching, and purge control features; temperature controllers; and multi-gas meter functions. Additionally, the cavity design of the system allows for easy integration of single-wafer or batch loaders and the decentralized mechanical design guarantees fast and easy maintenance. APPLIED MATERIALS/Centura DPS supports a wide range of fabrication processes such as etchback, oxide growth, oxynitride deposition, laser lift-off, and alkyl silicate deposition. Reliability isn't compromised when it comes to tasks such as oxide ashing, oxide deposition, nitride deposition, stripping or etching, or liftoff. What's more, AMAT / APPLIED MATERIALS Centura DPS is built with superior safety and environmental concerns in mind; it is a UL-approved device loaded with emergency shutoff valves and non-flammable process gases. AMAT / APPLIED MATERIALS/AMAT Centura DPS is the perfect choice for a range of fabrication applications. It offers complete process control and flexibility, combined with easy maintenance and great reliability. The machine is designed for robust operation, reliability and long-term performance, optimizing efficiency and quality of semiconductor processing processes.
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